Inventor

Mark Williams

Inventor

Beaufort, SC, US

Overview

2006–2017

Patent span

Physics

Primary field (CPC G)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

B82YSpecific uses or applications of nanostructures10%

H01JElectric discharge tubes or discharge lamps10%

H01LSemiconductor devices10%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

Y10TTechnical subjects covered by former us classification10%

G01BMeasuring length, thickness or similar linear dimensions5%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2006–2015Patents assigned to ASML HOLDING NV (3)· patent assignee history

2006–2015Based in Amherst, NH, US· patent location history

2014–2017Patents assigned to KLA TENCOR CORP (3)· patent assignee history

2014–2017Based in Beaufort, SC, US· patent location history

2017Patents assigned to CLYNE JOSHUA (1)· patent assignee history

2017Patents assigned to DI REGOLO JOSEPH A (1)· patent assignee history

2017Patents assigned to HALE LAYTON (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Beaufort, SC, US	3	2014–2017
Amherst, NH, US	3	2006–2015