LexDanaLexDanabeta
Inventor

Norio Ohkuma

Inventor
Machida, JP

Overview

49→
Patents
1990–2017
Patent span
Performing operations
Primary field (CPC B)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B41Jprimary
B41JTypewriters37%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
Y10TTechnical subjects covered by former us classification15%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
B41MPrinting, duplicating, marking, or copying processes4%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds2%
C08LCompositions of macromolecular compounds2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
G03HHolographic processes or apparatus2%
G06FElectric digital data processing2%
PatentTitleYear
9,815,271'Intermediate transfer member, image recording apparatus, and image recording method'20178,680,179'Composite composition for micropatterned layers'20148,535,796'Composite composition for micropatterned layers having high relaxation ability, high chemical resistance and mechanical stability'20138,251,491'Ink jet head and its manufacture method'20128,124,791'Active energy ray curable liquid composition and liquid cartridge'20128,087,748'Ink jet recording head, producing method therefor and composition for ink jet recording head'20128,012,364'Ink jet recording head, producing method therefor and composition for ink jet recording head'20117,985,477'Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming'20117,810,904'Ink jet recording head, producing method therefor and composition for ink jet recording head'20107,789,490'Liquid discharge head and method of manufacturing the same'20107,758,158'Ink jet head and its manufacture method'20107,658,469'Ink jet head and its manufacture method'20107,641,306'Wiper blade member for ink jet recording head, ink jet recording apparatus having wiper blade and ink jet recording method'20107,282,243'Pattern forming method and method of manufacturing ink jet recording head'20077,055,938'Liquid jet recording head and process for production thereof'20067,008,552'Method for making through-hole and ink-jet printer head fabricated using the method'20066,986,982'Resist material and method of manufacturing inkjet recording head using the same'20066,766,579'Method for manufacturing an ink jet head'20046,488,364'Recording method and apparatus for controlling ejection bubble formation'20026,461,798'Process for the production of an ink jet head'20026,460,970'Method of manufacturing nozzle plate for ink jet recording head, ink jet recording head comprising such nozzle plate, and ink jet recording apparatus comprising such head'20026,455,112'Method of manufacturing ink jet recording head and ink jet recording head manufactured by the method'20026,390,606'Ink-jet head, ink-jet head substrate, and a method for making the head'20026,379,571'Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus'20026,305,080'Method of manufacture of ink jet recording head with an elastic member in the liquid chamber portion of the substrate'20016,155,673'Recording method and apparatus for controlling ejection bubble formation'20006,145,965'Method for manufacturing an ink jet head, and an ink jet head'20006,139,761'Manufacturing method of ink jet head'20006,113,222'Ink jet recording head and a method for manufacturing such ink jet recording head'20006,107,209'Through hole formation method and a substrate provided with a through hole'20006,076,919'Jet recording method'20005,945,260'Method for manufacturing liquid jet recording head'19995,940,104'Ink jet head having sealing member with opening'19995,924,197'Method for manufacturing an ink jet printing head'19995,917,514'Sealing member for ink cartridge'19995,869,210'Photosensitive recording medium and method of preparing volume type phase hologram member using same'19995,786,832'Ink-jet recording head'19985,776,634'Photosensitive recording medium and method of preparing volume type phase hologram member using same'19985,730,889'Ink jet recording head, fabrication method thereof, and printer with ink jet recording head'19985,573,885'Image forming method and recording medium'19965,478,606'Method of manufacturing ink jet recording head'19955,458,254'Method for manufacturing liquid jet recording head'19955,331,344'Method for producing liquid-discharging recording head, liquid-discharging recording head produced by said method, and recording apparatus utilizing said recording head'19945,034,301'Recording medium'19914,992,351'Recording medium having a specified photopolymerization initiator'19914,977,058'Recording medium comprising a recording layer changing its transferability when provided with light and heat'19904,973,542'Transfer recording medium'19904,952,478'Transfer recording medium comprising a layer changing its transferability when provided with light and heat'19904,948,694'Recording medium comprising photopolymers'1990

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1990–2017Patents assigned to CANON KK (49)· patent assignee history
1990–2017Based in Machida, JP· patent location history
1990–2014Based in Tokyo, JP· patent location history
1994–2006Based in Yokohama, JP· patent location history
2012–2014Patents assigned to OHKUMA NORIO (5)· patent assignee history
2012–2014Patents assigned to BECKER-WILLINGER CARSTEN (4)· patent assignee history
2012–2014Patents assigned to HINO ETSUKO (4)· patent assignee history
2012–2014Patents assigned to KALMES PAMELA (4)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CANON KK491990–2017
OHKUMA NORIOself52012–2014
BECKER-WILLINGER CARSTEN42012–2014
HINO ETSUKO42012–2014
KALMES PAMELA42012–2014
Locations
LocationPatentsSpan
Machida, JP191990–2017
Yokohama, JP191994–2006
Tokyo, JP111990–2014