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Inventor

Luis Markoya

Inventor
Sandy Hook, CT, US

Overview

1→
Patents
2004
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,800,408'Use of multiple reticles in lithographic printing tools'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004Patents assigned to ASML HOLDING NV (1)· patent assignee history
2004Based in Sandy Hook, CT, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV12004
Locations
LocationPatentsSpan
Sandy Hook, CT, US12004