Inventor
Maarten Steinbuch
Inventor
Eindhoven, NL
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G05BControl or regulating systems in general25%
H03HImpedance networks, e.g. resonant circuits25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
7,181,296'Method of adaptive interactive learning control and a lithographic manufacturing process and apparatus employing such a method'20075,784,272'Control system for a process that exhibits periodic disturbances'19985,740,090'Filter, repetitive control system and learning control system both provided with such filter'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to PHILIPS CORP (2)· patent assignee history
1998Based in Eindhoven, NL· patent location history
2007Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2007Based in Helmond, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PHILIPS CORP | 2 | 1998 |
| ASML NETHERLANDS BV | 1 | 2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 2 | 1998 |
| Helmond, NL | 1 | 2007 |