Inventor
Donna R. Cote
Inventor
Poughquag, NY, US
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1021%
C23CCoating metallic material8%
H10DInorganic electric semiconductor devices8%
H01HElectric switches5%
H10BElectronic memory devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems3%
C03CChemical composition of glasses, glazes or vitreous enamels3%
PatentTitleYear
7,456,420'Electrode for phase change memory device and method'20086,798,029'Method of fabricating micro-electromechanical switches on CMOS compatible substrates'20046,635,506'Method of fabricating micro-electromechanical switches on CMOS compatible substrates'20036,489,255'Low temperature/low dopant oxide glass film'20026,483,172'Semiconductor device structure with hydrogen-rich layer for facilitating passivation of surface states'20026,274,440'Manufacturing of cavity fuses on gate conductor level'20016,252,295'Adhesion of silicon carbide films'20016,077,786'Methods and apparatus for filling high aspect ratio structures with silicate glass'20005,926,689'Process for reducing circuit damage during PECVD in single wafer PECVD system'19995,855,962'Flowable spin-on insulator'19995,753,303'Process for the elimination of tungsten oxidation with inert gas stabilization in chemical vapor deposition processes'19985,352,927'Self-aligned contact studs for semiconductor structures'19945,217,567'Selective etching process for boron nitride films'19935,216,282'Self-aligned contact studs for semiconductor structures'19935,187,121'Process for fabrication of a semiconductor structure and contact stud'19935,166,096'Process for fabricating self-aligned contact studs for semiconductor structures'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2008Patents assigned to IBM (16)· patent assignee history
1992–2008Based in Poughquag, NY, US· patent location history
1998Based in Dutchess County, NY, US· patent location history
1999–2002Patents assigned to SIEMENS AG (2)· patent assignee history
1999Based in Paughquag, NY, US· patent location history
2001–2004Based in Poughkeepsie, NY, US· patent location history
2002Based in Poughguag, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 16 | 1992–2008 |
| SIEMENS AG | 2 | 1999–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Poughquag, New York, US | 8 | 1992–2008 |
| Poughkeepsie, New York, US | 5 | 2001–2004 |
| Poughguag, New York, US | 1 | 2002 |
| Paughquag, New York, US | 1 | 1999 |
| Dutchess County, New York, US | 1 | 1998 |