Inventor
Makoto Ezumi
Inventor
Mito, JP
Overview
Patents· 55 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps68%
G01NInvestigating or analysing materials by determining their chemical or physical properties16%
G06TImage data processing or generation, in general7%
G01RMeasuring electric variables5%
G01BMeasuring length, thickness or similar linear dimensions2%
G02BOptical elements, systems or apparatus1%
PatentTitleYear
9,230,775'Charged particle instrument'20168,835,844'Sample electrification measurement method and charged particle beam apparatus'20148,698,080'Scanning electron microscope'20148,686,380'Charged particle beam apparatus'20148,481,934'Method for inspecting and measuring sample and scanning electron microscope'20138,338,781'Charged particle beam scanning method and charged particle beam apparatus'20128,080,789'Sample dimension measuring method and scanning electron microscope'20118,067,733'Scanning electron microscope having a monochromator'20117,977,632'Scanning electron microscope'20117,960,696'Method for inspecting and measuring sample and scanning electron microscope'20117,935,925'Charged particle beam scanning method and charged particle beam apparatus'20117,838,827'Monochromator and scanning electron microscope using the same'20107,718,976'Charged particle beam apparatus'20107,714,286'Charged particle beam apparatus, aberration correction value calculation unit therefor, and aberration correction program therefor'20107,700,918'Sample electrification measurement method and charged particle beam apparatus'20107,659,508'Method for measuring dimensions of sample and scanning electron microscope'20107,642,514'Charged particle beam apparatus'20107,612,336'Scanning electron microscope having a monochromator'20097,605,381'Charged particle beam alignment method and charged particle beam apparatus'20097,566,872'Scanning electron microscope'20097,459,681'Scanning electron microscope'20087,442,923'Scanning electron microscope'20087,408,172'Charged particle beam apparatus and charged particle beam irradiation method'20087,399,966'Scanning electron microscope'20087,372,028'Sample electrification measurement method and charged particle beam apparatus'20087,355,174'Charged particle beam emitting device and method for adjusting the optical axis'20087,329,868'Charged particle beam apparatus'20087,315,024'Monochromator and scanning electron microscope using the same'20087,294,835'Scanning electron microscope'20077,282,722'Charged particle beam apparatus and charged particle beam irradiation method'20077,109,485'Charged particle beam apparatus'20067,087,899'Sample electrification measurement method and charged particle beam apparatus'20067,075,078'Scanning electron microscope'20067,049,591'Scanning electron microscope'20067,022,983'Monochromator and scanning electron microscope using the same'20066,956,211'Charged particle beam apparatus and charged particle beam irradiation method'20056,946,656'Sample electrification measurement method and charged particle beam apparatus'20056,936,818'Charged particle beam apparatus'20056,885,001'Scanning electron microscope'20056,872,944'Scanning electron microscope'20056,864,493'Charged particle beam alignment method and charged particle beam apparatus'20056,847,038'Scanning electron microscope'20056,787,772'Scanning electron microscope'20046,667,476'Scanning electron microscope'20036,653,633'Charged particle beam apparatus'20036,646,262'Scanning electron microscope'20036,635,873'Scanning electron microscope with voltage applied to the sample'20036,538,249'Image-formation apparatus using charged particle beams under various focus conditions'20036,512,228'Scanning electron microscope'20036,444,981'Scanning electron microscope'20026,084,238'Scanning electron microscope'20006,069,356'Scanning electron microscope'20005,900,629'Scanning electron microscope'19995,872,358'Scanning electron microscope'19995,608,218'Scanning electron microscope'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2014Patents assigned to HITACHI LTD (35)· patent assignee history
1997Based in Katsuta, JP· patent location history
1999–2016Based in Mito, JP· patent location history
2005–2016Patents assigned to HITACHI HIGH TECH CORP (20)· patent assignee history
2011–2016Patents assigned to EZUMI MAKOTO (8)· patent assignee history
2011–2014Patents assigned to OSE YOICHI (3)· patent assignee history
2011–2014Patents assigned to FUKAYA RITSUO (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 35 | 1997–2014 |
| HITACHI HIGH TECH CORP | 20 | 2005–2016 |
| EZUMI MAKOTOself | 8 | 2011–2016 |
| OSE YOICHI | 3 | 2011–2014 |
| FUKAYA RITSUO | 2 | 2011–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mito, JP | 54 | 1999–2016 |
| Katsuta, JP | 1 | 1997 |