Inventor
MASAHIRO FUJITA
Inventor
JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material11%
H01JElectric discharge tubes or discharge lamps9%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for7%
A47JKitchen equipment7%
B25JManipulators7%
A23PShaping or working of foodstuffs, not fully covered by a single other subclass4%
A23VIndexing scheme relating to foods, foodstuffs or non-alcoholic beverages and lactic or propionic acid bacteria used in foodstuffs or food preparation4%
A61BDiagnosis4%
B24BMachines, devices, or processes for grinding or polishing4%
G05BControl or regulating systems in general4%
PatentTitleYear
12,514,398Data processing device and data processing method202612,491,627Information processing apparatus and cooking system202512,337,896Track deviation prevention device202512,300,031Information processing apparatus, information processing method, and artificial intelligence model manufacturing method202512,217,948Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target202512,171,365Cooking robot, cooking robot control device, and control method202412,163,025Curable polyorganosiloxane composition and polyorganosiloxane cured product202412,051,577Sputtering target, method of bonding target material and backing plate, and method of manufacturing sputtering target202411,995,580Data processing device and data processing method202411,961,964Method of producing lithium-ion secondary battery, lithium-ion secondary battery, and method of using zwitterionic compound202411,940,303Position detection device and position detection method202411,919,442Vehicle interior lighting device202411,766,726Method for machining sputtering target, apparatus for machining sputtering target, sputtering target, and method for producing sputtering target product202311,731,230Method for manufacturing sputtering target and sputtering target202311,618,942Sputtering-target material, sputtering target, sputtering-target aluminum plate, and method of manufacturing the same202311,142,819Sputtering target2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to SUMITOMO CHEMICAL CO (6)· patent assignee history
2021–2026Based in JP· patent location history
2024–2026Patents assigned to SONY GROUP CORP (5)· patent assignee history
2024–2025Patents assigned to TOYOTA MOTOR CO LTD (3)· patent assignee history
2024Patents assigned to MOMENTIVE PERFORMANCE MAT JP (1)· patent assignee history
2024Patents assigned to SONY CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 6 | 2021–2025 |
| SONY GROUP CORP | 5 | 2024–2026 |
| TOYOTA MOTOR CO LTD | 3 | 2024–2025 |
| MOMENTIVE PERFORMANCE MAT JP | 1 | 2024 |
| SONY CORP | 1 | 2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 16 | 2021–2026 |