Inventor
Kazuaki Kaneko
Inventor
Tokyo, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h109%
Y10TTechnical subjects covered by former us classification9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%
H10HInorganic light-emitting semiconductor devices having potential barriers8%
H01LSemiconductor devices6%
G02BOptical elements, systems or apparatus5%
H04NPictorial communication, e.g. television5%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding3%
C08LCompositions of macromolecular compounds3%
PatentTitleYear
10,680,405Semiconductor light-emitting device202010,666,881Solid-state image sensor and electronic device202010,516,859Solid-state image sensor and electronic device201910,477,123Image sensor, electronic apparatus, signal transmission system, and control method201910,374,133Light emitting apparatus with two primary lighting peaks201910,342,091Light-emitting device20199,923,126'Light emitting device having high color rendering using three phosphor types'20189,883,588'Oriented copper plate, copper-clad laminate, flexible circuit board, and electronic device'20189,835,692Magnetic detection device20179,274,252'Polycarbonate resin composition'20169,163,116'Polycarbonate resin composition'20158,058,384'Method for producing thermoplastic resin, polyester resin and polycarbonate resin, and their applications'20118,026,336'Polycarbonate resin composition and method of producing the same'20117,976,716'Semiconductor device manufacturing method'20117,944,677'Electrostatic chuck'2011RE042175'Electrostatic chucking stage and substrate processing apparatus'20117,615,133'Electrostatic chuck module and cooling system'20097,513,063'Substrate processing apparatus'20097,247,985'Semiconductor light-emitting device having annular shape light emitting region and current blocking layer'20077,220,319'Electrostatic chucking stage and substrate processing apparatus'20077,175,737'Electrostatic chucking stage and substrate processing apparatus'20077,026,743'Surface acoustic wave device having high dielectric strength and process for manufacturing the same'20067,011,744'Brine supply unit'20066,911,673'Light emitting diode device'20056,887,580'Adhesive polyimide resin and adhesive laminate'20056,838,807'Surface acoustic wave device suitable for use in GHz band'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2020Patents assigned to SHARP KK (6)· patent assignee history
2005–2017Patents assigned to ALPS ELECTRIC CO LTD (3)· patent assignee history
2005–2017Based in Niigata, JP· patent location history
2005–2007Based in Nara, JP· patent location history
2006–2016Based in Tokyo, JP· patent location history
2007–2011Patents assigned to CANON ANELVA CORP (7)· patent assignee history
2011–2016Patents assigned to MITSUBISHI GAS CHEMICAL CO (4)· patent assignee history
2011–2016Patents assigned to FURUHASHI HIROKI (3)· patent assignee history
2018–2020Based in Sakai, JP· patent location history
2019–2020Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON ANELVA CORP | 7 | 2007–2011 |
| SHARP KK | 6 | 2005–2020 |
| MITSUBISHI GAS CHEMICAL CO | 4 | 2011–2016 |
| ALPS ELECTRIC CO LTD | 3 | 2005–2017 |
| FURUHASHI HIROKI | 3 | 2011–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 10 | 2006–2016 |
| Sakai, JP | 4 | 2018–2020 |
| Kanagawa, JP | 3 | 2019–2020 |
| Niigata, JP | 3 | 2005–2017 |
| Nara, JP | 2 | 2005–2007 |