Inventor

Yukako Harada

Inventor

Settu, JP

Overview

2007–2013

Patent span

Chemistry

Primary field (CPC C)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary

C07CAcyclic or carbocyclic compounds30%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices28%

C07DHeterocyclic compounds16%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

C08JWorking-up5%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%

F16KValves2%

PatentTitleYear

8,378,016'Chemically amplified positive resist composition'2013 8,124,803'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2012 7,932,334'Resin suitable for an acid generator'2011 7,862,980'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'2011 7,786,322'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2010 7,759,045'Chemically amplified positive resist composition'2010 7,667,050'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'2010 7,612,217'Sulfonium compound'2009 7,579,497'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2009 7,579,132'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'2009 7,531,686'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2009 7,527,910'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2009 7,439,006'Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same'2008 7,304,175'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2007 7,301,047'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2007 7,262,321'Salt suitable for an acid generator and a chemically amplified resist composition containing the same'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2013Patents assigned to SUMITOMO CHEMICAL CO (16)· patent assignee history

2007–2013Based in Settu, JP· patent location history

2008–2011Based in Settsu, JP· patent location history

2012–2013Patents assigned to ANDO NOBUO (2)· patent assignee history

2012–2013Patents assigned to HARADA YUKAKO (2)· patent assignee history

2012–2013Patents assigned to YOSHIDA ISAO (2)· patent assignee history

2013Patents assigned to TAKEMOTO ICHIKI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SUMITOMO CHEMICAL CO	16	2007–2013
ANDO NOBUO	2	2012–2013
HARADA YUKAKOself	2	2012–2013
YOSHIDA ISAO	2	2012–2013
TAKEMOTO ICHIKI	1	2013

Locations

Location	Patents	Span
Settu, JP	8	2007–2013
Settsu, JP	8	2008–2011