Inventor
Benjamin Biedermann
Inventor
München, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus33%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light33%
A61BDiagnosis17%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light17%
Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2014Patents assigned to BIEDERMANN BENJAMIN (3)· patent assignee history
2013–2014Patents assigned to EIGENWILLIG CHRISTOPH (3)· patent assignee history
2013–2014Patents assigned to HUBER ROBERT ALEXANDER (2)· patent assignee history
2013–2014Based in München, DE· patent location history
2014–2016Patents assigned to UNIV MUENCHEN LUDWIG MAXIMILIANS (2)· patent assignee history
2014Patents assigned to EDER MICHAEL (1)· patent assignee history
2014Based in Müchen, DE· patent location history
2016Based in Germering, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BIEDERMANN BENJAMINself | 3 | 2013–2014 |
| EIGENWILLIG CHRISTOPH | 3 | 2013–2014 |
| HUBER ROBERT ALEXANDER | 2 | 2013–2014 |
| UNIV MUENCHEN LUDWIG MAXIMILIANS | 2 | 2014–2016 |
| EDER MICHAEL | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| München, DE | 2 | 2013–2014 |
| Germering, DE | 1 | 2016 |
| Müchen, DE | 1 | 2014 |