Inventor

Ichiro Hayashida

Inventor
Saitama, JP

Overview

15→
Patents
1994–2014
Patent span
Chemistry
Primary field (CPC C)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
C11DDetergent compositions33%
C01BNon-metallic elements5%
C23FNon-mechanical removal of metallic material from surface5%
C23GCleaning or de-greasing of metallic material by chemical methods other than electrolysis5%
H01LSemiconductor devices5%
C09GPolishing compositions3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1994–2014Patents assigned to WAKO PURE CHEM IND LTD (13)· patent assignee history
1994–1998Based in Kawagoe, JP· patent location history
2000–2014Based in Saitama, JP· patent location history
2009Patents assigned to FUJIMI INC (1)· patent assignee history
2009Based in Iruma, JP· patent location history
2013–2014Patents assigned to HAYASHIDA ICHIRO (2)· patent assignee history
2013Patents assigned to KIKUCHI NOBUYUKI (1)· patent assignee history
2013–2014Based in Tokyo, JP· patent location history
2014Patents assigned to KAKIZAWA MASAHIKO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
WAKO PURE CHEM IND LTD131994–2014
HAYASHIDA ICHIROself22013–2014
FUJIMI INC12009
KAKIZAWA MASAHIKO12014
KIKUCHI NOBUYUKI12013
Locations
LocationPatentsSpan
Saitama, JP92000–2014
Kawagoe, JP31994–1998
Tokyo, JP22013–2014
Iruma, JP12009