Inventor

Nobukazu Ikeda

Inventor

Osaka, JP

Overview

1993–2021

Patent span

Physics

Primary field (CPC G)

Patents· 178 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary

Y10TTechnical subjects covered by former us classification18%

G05DSystems for controlling or regulating non-electric variables17%

F16KValves12%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

G01FMeasuring volume, volume flow, mass flow or liquid level7%

F16LPipes6%

C23CCoating metallic material4%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%

C01BNon-metallic elements3%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%

PatentTitleYear

11,079,774Flow rate control device2021 11,054,052Piezoelectric-element-driven valve and flow rate control device2021 10,976,240Concentration measurement device2021 10,969,259Flow rate control device, method of calibrating flow rate of flow rate control device, flow rate measuring device, and method of measuring flow rate using flow rate measuring device2021 10,928,303Concentration measuring device2021 10,928,813Pressure-type flow rate control device and flow rate self-diagnosis method using critical expansion condition2021 10,895,484Gas supply device capable of measuring flow rate, flowmeter, and flow rate measuring method2021 10,884,435Pressure type flow rate control device, and flow rate calculating method and flow rate control method for same2021 10,884,436Flow rate signal correction method and flow rate control device employing same2021 10,883,866Pressure-based flow rate control device and malfunction detection method therefor2021 10,876,870Method of determining flow rate of a gas in a substrate processing system2020 10,838,435Pressure-type flow rate control device2020 10,648,572Valve with built-in orifice, and pressure-type flow rate control device2020 10,646,844Vaporization supply apparatus2020 10,641,407Flow rate control device2020 10,604,840Liquid level indicator and liquid raw material vaporization feeder2020 10,534,376Gas divided flow supplying apparatus for semiconductor manufacturing equipment2020 10,408,742Optical gas concentration measuring method by forming a differential signal using lights with different absorbabilities to a raw material in a gas flow path using a time-sharing method2019 10,386,863Pressure-type flow controller2019 10,386,861Pressure type flow control system with flow monitoring, and method for detecting anomaly in fluid supply system and handling method at abnormal monitoring flow rate using the same2019 10,372,145Pressure-type flow rate control device2019 10,371,630Inline concentration meter and concentration detection method2019 10,324,029Concentration measurement device2019 10,309,561Flow passage sealing structure2019 10,274,356Liquid level detection circuit, liquid level meter, container provided with liquid level meter, and vaporizer using container2019 10,261,522Pressure-type flow rate control device2019 10,222,323Inline concentration measurement device2019 10,174,858Piezoelectric element-driven valve and flow rate control device including piezoelectric element-driven valve2019 10,156,295Piezoelectric linear actuator, piezoelectrically driven valve, and flow rate control device2018 10,073,469Flow meter and flow control device provided therewith2018 10,030,789Diaphragm valve2018 10,012,334Structure for attaching pressure detector2018 9,994,955Raw material vaporization and supply apparatus2018 9,983,051Fastening structure for brittle-fracturable panel, and method for fastening light transmission window panel comprising brittle-fracturable panel employing same2018 9,921,089'Flow rate range variable type flow rate control apparatus'2018 9,870,006'Pressure type flow control system with flow monitoring'2018 9,841,770'Pressure-type flow control device and method for preventing overshooting at start of flow control performed by said device'2017 9,791,867'Flow control device equipped with flow monitor'2017 9,746,856'Multi-hole orifice plate for flow control, and flow controller using the same'2017 9,733,649'Flow control system with build-down system flow monitoring'2017 9,702,781'Leakage detection device and fluid controller including same'2017 9,651,467'Raw material fluid density detector'2017 9,638,560'Calibration method and flow rate measurement method for flow rate controller for gas supply device'2017 9,631,777'Raw material vaporizing and supplying apparatus equipped with raw material concentration'2017 9,632,511'Pressure type flow control system with flow monitoring, and method for detecting anomaly in fluid supply system and handling method at abnormal monitoring flow rate using the same'2017 9,574,917'Pressure type flow rate control device'2017 9,556,518'Raw material gas supply apparatus for semiconductor manufacturing equipment'2017 9,507,352'Variable orifice type pressure-controlled flow controller'2016 9,494,947'Pressure type flow control system with flow monitoring'2016 9,477,232'Apparatus for dividing and supplying gas and method for dividing and supplying gas'2016 9,383,758'Flow rate range variable type flow rate control apparatus'2016 9,261,884'Apparatus for dividing and supplying gas and method for dividing and supplying gas by use of this apparatus'2016 9,233,347'Mixed gas supply device'2016 9,200,725'Opening degree detection device for manual valve'2015 9,169,558'Fluid control apparatus'2015 9,163,743'Piezoelectrically driven valve and piezoelectrically driven flow rate control device'2015 9,163,969'Flow rate measurement device and flow rate measurement method for flow rate controller for gas supply device'2015 9,133,951'Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employed'2015 9,098,082'Device and method for supplying gas while dividing to chamber from gas supplying facility equipped with flow controller'2015 9,038,663'Opening degree detection device for automatically operated valve'2015 9,010,369'Flow rate range variable type flow rate control apparatus'2015 8,931,506'Gas supply apparatus equipped with vaporizer'2015 8,833,730'Cam control valve'2014 8,757,197'Automatic pressure regulator for flow rate regulator'2014 8,724,974'Vaporizer'2014 8,714,188'Method for water hammerless opening of fluid passage, and method for supplying chemical solutions and device for water hammerless opening for which the method is used'2014 8,662,471'Solenoid valve'2014 8,601,976'Gas supply system for semiconductor manufacturing facilities'2013 8,606,412'Method for detecting malfunction of valve on the downstream side of throttle mechanism of pressure type flow control apparatus'2013 8,587,180'Pressure control valve driving circuit for pressure type flow rate control device with flow rate self-diagnosis function'2013 8,561,966'Cam valve'2013 8,555,920'Flow rate ratio variable type fluid supply apparatus'2013 8,496,022'Device and method for supplying gas while dividing to chamber from gas supplying facility equipped with flow controller'2013 8,469,046'Method for parallel operation of reactors that generate moisture'2013 8,418,714'Flow rate range variable type flow rate control apparatus'2013 8,381,755'Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same'2013 8,246,087'Fluid coupling'2012 8,210,022'Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same'2012 8,191,856'Piezoelectric element driven metal diaphragm control valve'2012 8,181,932'Normally open type piezoelectric element driven metal diaphragm control valve'2012 8,162,286'Piezoelectric driven control valve'2012 8,137,787'Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas'2012 8,047,225'Method for water hammerless opening of fluid passage, and method for supplying chemical solutions and device for water hammerless opening for which the method is used'2011 8,047,510'Evaporation supply apparatus for raw material and automatic pressure regulating device used therewith'2011 8,020,574'Method for closing fluid passage, and water hammerless valve device and water hammerless closing device used in the method'2011 7,988,130'Valve for vacuum exhaustion system'2011 7,945,414'Method for detecting abnormality in fluid supply line using fluid control apparatus with pressure sensor'2011 7,935,385'Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas'2011 7,926,509'Method for flow rate control of clustering fluid and device for flow rate control of clustering fluid employed in the method'2011 7,849,869'Method for water hammerless opening of fluid passage, and method for supplying chemical solutions and device for water hammerless opening for which the method is used'2010 7,841,628'Joint for use in fluid control apparatus'2010 7,815,872'Reactor for generating moisture and moisture generating and feeding apparatus for which the reactor is employed'2010 7,798,167'Internal pressure controller of chamber and internal pressure subject-to-control type chamber'2010 7,673,649'Vacuum thermal insulating valve'2010 7,669,455'Automatic zero point correction device for a pressure sensor, a pressure control device and a pressure type flow rate control device'2010 7,654,137'Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed'2010 7,595,087'Process of forming platinum coating catalyst layer in moisture-generating reactor'2009 7,594,517'Gas supply facility of a chamber and a method for an internal pressure control of the chamber for which the facility is employed'2009 7,553,459'Apparatus and reactor for generating and feeding high purity moisture'2009 7,497,482'Pipe joint'2009 7,472,887'Valve for vacuum exhaustion system'2009 7,416,165'Diaphragm valve for the vacuum exhaustion system'2008 7,368,092'Apparatus and reactor for generating and feeding high purity moisture'2008 7,367,241'Differential pressure type flowmeter and differential pressure type flow controller'2008 7,363,810'Corrosion resistant metal made thermal type mass flow rate sensor and a fluid supply device using the same'2008 7,278,437'Method for closing fluid passage, and water hammerless valve device and water hammerless closing device used in the method'2007 7,258,845'Apparatus and reactor for generating and feeding high purity moisture'2007 7,219,533'Small hole diameter automatic measuring apparatus, small hole diameter measurement method, and shower plate manufacturing method'2007 7,150,444'Valve with an integral orifice'2006 7,103,990'Rotary silicon wafer cleaning apparatus'2006 7,085,628'Apparatus for the correction of temperature drift for pressure sensor, pressure control apparatus and pressure-type flow rate control apparatus'2006 7,080,658'Method for closing fluid passage, and water hammerless valve device and water hammerless closing device used in the method'2006 7,059,363'Method of supplying divided gas to a chamber from a gas supply apparatus equipped with a flow-rate control system'2006 7,008,598'Reactor for generating moisture'2006 6,964,279'Pressure-type flow rate control apparatus'2005 6,919,056'Reactor for generating moisture'2005 6,871,803'Valve with an integral orifice'2005 6,848,470'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'2005 6,820,632'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'2004 6,733,732'Reactor for generating moisture'2004 6,672,942'Grinding machine for welding electrodes'2004 6,622,543'Gas detection sensor'2003 6,615,871'Fluid control apparatus'2003 6,606,912'Structure or construction for mounting a pressure detector'2003 6,450,190'Method of detecting abnormalities in flow rate in pressure-type flow controller'2002 6,422,264'Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus'2002 6,408,879'Fluid control device'2002 6,394,415'Fluid control valve and fluid supply/exhaust system'2002 6,387,158'Method of removing moisture in gas supply system'2002 6,360,762'Method for feeding gases for use in semiconductor manufacturing'2002 6,334,962'Low flow rate moisture supply process'2002 6,302,130'Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers'2001 6,289,923'Gas supply system equipped with pressure-type flow rate control unit'2001 6,273,477'Gasket and pipe joint'2001 6,274,098'Apparatus for the treatment of exhaust gases by combining hydrogen and oxygen'2001 6,273,139'Fluid control apparatus'2001 6,257,270'Fluid control device'2001 6,210,482'Apparatus for feeding gases for use in semiconductor manufacturing'2001 6,193,212'Fluid control valve and fluid supply/exhaust system'2001 6,180,067'Reactor for the generation of water'2001 6,178,995'Fluid supply apparatus'2001 6,170,890'Pipe joint'2001 6,158,679'Orifice for pressure type flow rate control unit and process for manufacturing orifice'2000 6,152,168'Pressure-type flow rate control apparatus'2000 6,145,888'Pipe joint with inspection window'2000 6,135,155'Fluid control device'2000 6,129,098'Apparatus for injecting constant quantitative chemicals and a method thereof'2000 6,116,092'Fluid pressure detector using a diaphragm'2000 6,093,662'Method for generating water for semiconductor production'2000 6,060,691'Device for heating fluid controller'2000 6,039,360'Couplings for fluid controllers'2000 6,035,893'Shutoff-opening devices and fluid control apparatus comprising such devices'2000 6,018,136'System for supervising piping work'2000 6,014,498'Device for heating fluid control apparatus'2000 5,988,217'Shutoff-opening device'1999 5,983,933'Shutoff-opening device'1999 5,981,905'System for supervising piping work'1999 5,975,112'Fluid control device'1999 5,950,675'Backflow prevention apparatus for feeding a mixture of gases'1999 5,904,381'Fluid coupling'1999 5,879,819'Sliding parts and process for producing same'1999 5,850,853'Fluid control system and valve to be used therein'1998 5,816,285'Pressure type flow rate control apparatus'1998 5,791,369'Pressure type flow rate control apparatus'1998 5,769,110'Fluid control apparatus'1998 5,720,505'Pipe joint'1998 5,678,803'Fluid controller'1997 5,669,408'Pressure type flow rate control apparatus'1997 5,609,077'Tightening device'1997 5,530,283'Lead frame and lead frame material'1996 5,520,492'Sliding parts and method of producing same'1996 5,502,883'Method of tightening threaded member'1996 5,488,967'Method and apparatus for feeding gas into a chamber'1996 5,482,332'Pipe joint'1996 5,440,096'Welding process with delayed application of full current until after start of arc'1995 5,366,261'Pipe joint with a gasket retainer'1994 5,308,124'Thrust ring for pipe joints'1994 5,186,434'Fluid flow controller'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–2021Based in Osaka, JP· patent location history

1994–2021Patents assigned to FUJIKIN KK (165)· patent assignee history

1998–2015Patents assigned to OHMI TADAHIRO (33)· patent assignee history

1999–2020Patents assigned to TOKYO ELECTRON LTD (29)· patent assignee history

2006Based in Saitama-shi, JP· patent location history

2008–2017Patents assigned to IKEDA NOBUKAZU (31)· patent assignee history

2012–2017Patents assigned to NISHINO KOUJI (25)· patent assignee history

2021Based in Osaka-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJIKIN KK	165	1994–2021
OHMI TADAHIRO	33	1998–2015
IKEDA NOBUKAZUself	31	2008–2017
TOKYO ELECTRON LTD	29	1999–2020
NISHINO KOUJI	25	2012–2017

Locations

Location	Patents	Span
Osaka, JP	175	1993–2021
Osaka-shi, JP	2	2021
Saitama-shi, JP	1	2006