Inventor
TSUTOMU SHOKI
Inventor
JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
C23CCoating metallic material9%
H01LSemiconductor devices3%
PatentTitleYear
12,313,968Reflective mask blank, reflective mask, and method for manufacturing semiconductor device202512,135,496Reflective mask blank and reflective mask202412,111,566Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method202412,105,413Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device202412,072,619Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device202412,025,911Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor device202412,019,366Reflective mask blank, reflective mask, and method for manufacturing reflective mask and semiconductor device202411,880,130Reflective mask blank, reflective mask and method of manufacturing semiconductor device202411,852,964Method for manufacturing reflective mask blank, reflective mask blank, method for manufacturing reflective mask, reflective mask, and method for manufacturing semiconductor device202311,815,806Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method202311,815,807Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device202311,681,214Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device202311,561,463Substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method202311,550,215Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device202311,531,264Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method202211,480,867Reflective mask blank, reflective mask and method of manufacturing semiconductor device202211,281,090Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device202211,262,647Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method202211,249,385Reflective mask blank, reflective mask, method of manufacturing same, and method of manufacturing semiconductor device202211,187,972Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor device2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to HOYA CORP (20)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOYA CORP | 20 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 20 | 2021–2025 |