Inventor
KATSUAKI NISHIKORI
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
C07CAcyclic or carbocyclic compounds21%
C07DHeterocyclic compounds16%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds16%
C08LCompositions of macromolecular compounds5%
C09DCoating compositions, e.g. paints, varnishes or lacquers5%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
C07JSteroids3%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
PatentTitleYear
12,560,866Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound202612,372,869Method for forming resist pattern and radiation-sensitive resin composition202512,259,653Radiation-sensitive resin composition, method of forming resist pattern, and compound202512,092,957Radiation-sensitive resin composition, method for forming resist pattern and compound202411,966,161Radiation-sensitive resin composition, method of forming resist pattern, and compound202411,609,495Radiation-sensitive resin composition and resist pattern-forming method202311,592,746Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acid202311,320,735Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid202211,281,100Radiation-sensitive resin composition, onium salt compound and method for forming resist pattern2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to JSR CORP (9)· patent assignee history
2022–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 9 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2022–2026 |