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Inventor

Jeffrey A. Schefske

Inventor
San Jose, CA, US

Overview

3→
Patents
2003–2010
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
PatentTitleYear
7,741,012'Method for removal of immersion lithography medium in immersion lithography processes'20107,014,966'Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems'20066,608,321'Differential wavelength inspection system'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2010Patents assigned to ADVANCED MICRO DEVICES INC (3)· patent assignee history
2003–2010Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADVANCED MICRO DEVICES INC32003–2010
Locations
LocationPatentsSpan
San Jose, California, US32003–2010