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Inventor

Daisuke Okamura

Inventor
Tokyo, JP

Overview

11→
Patents
2004–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation14%
C02FTreatment of water, waste water, sewage, or sludge12%
Y02WClimate change mitigation technologies related to wastewater treatment or waste management10%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts7%
B29LIndexing scheme associated with subclass b29c, relating to particular articles7%
B29BPreparation or pretreatment of the material to be shaped5%
C08JWorking-up5%
D01FChemical features in the manufacture of artificial filaments, threads, fibres, bristles or ribbons5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
11,110,402Porous hollow fiber membrane, method for producing porous hollow fiber membrane and filtration method202110,974,204Porous membrane and process for producing porous membrane202110,751,671Porous hollow fiber membrane, method for producing same, and water purification method202010,023,709Multiporous hollow-fiber membrane and process for producing multiporous hollow-fiber membrane20188,569,101'Method for forming an absorber layer of a thin film solar cell'20138,097,161'Wastewater treatment method'20128,033,009'Method for producing a force sensor'20117,704,394'Hollow fiber membrane cartridge'20107,578,940'Membrane cartridge, membrane separating device, and membrane separating method'20097,087,671'Recycled plastic molded parts for photosensitive materials'20066,783,715'Method of recycling molded plastic parts for photosensitive material and recycled plastic molded parts'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2006Patents assigned to FUJI PHOTO FILM CO LTD (2)· patent assignee history
2004–2006Based in Kanagawa, JP· patent location history
2009–2018Patents assigned to ASAHI KASEI CHEMICALS CORP (4)· patent assignee history
2009–2010Based in Fuji, JP· patent location history
2011–2013Patents assigned to HONDA MOTOR CO LTD (2)· patent assignee history
2011Based in Saitama, JP· patent location history
2012–2013Patents assigned to OKAMURA DAISUKE (2)· patent assignee history
2012–2021Based in Tokyo, JP· patent location history
2013Based in Wako, JP· patent location history
2020–2021Patents assigned to ASAHI CHEMICAL IND (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASAHI KASEI CHEMICALS CORP42009–2018
ASAHI CHEMICAL IND32020–2021
FUJI PHOTO FILM CO LTD22004–2006
HONDA MOTOR CO LTD22011–2013
OKAMURA DAISUKEself22012–2013
Locations
LocationPatentsSpan
Tokyo, JP52012–2021
Fuji, JP22009–2010
Kanagawa, JP22004–2006
Wako, JP12013
Saitama, JP12011