Inventor
Markus Weiss
Inventor
Aalen, DE
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
B82YSpecific uses or applications of nanostructures18%
G02BOptical elements, systems or apparatus15%
G21KHandling of particles or ionising radiation not otherwise provided for15%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
H05GX-ray technique3%
B08BCleaning in general1%
B65CLabelling or tagging machines, apparatus, or processes1%
B66BElevators1%
F01LCyclically operating valves for machines or engines1%
PatentTitleYear
10,061,292Method for aligning a strip of labels20189,284,860'Valve housing for a control valve of a camshaft adjusting system, and method for producing a valve housing'20168,546,776'Optical system for EUV lithography with a charged-particle source'20138,513,628'EUV illumination system with a system for measuring fluctuations of the light source'20138,212,992'Device for damping vibrations in projection exposure apparatuses for semiconductor lithography'20128,164,077'Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element'20127,875,865'EUV illumination system with a system for measuring fluctuations of the light source'20117,802,891'Faceted mirror apparatus'20107,646,004'Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element'20107,491,951'Lithographic apparatus, system and device manufacturing method'20097,473,907'Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination'20097,460,212'Collector configured of mirror shells'20087,362,414'Optical system having an optical element that can be brought into at least two positions'20087,354,168'Facet mirror having a number of mirror facets'20087,321,126'Collector with fastening devices for fastening mirror shells'20087,246,909'Method for the production of a facetted mirror'20077,248,667'Illumination system with a grating element'20077,244,954'Collector having unused region for illumination systems using a wavelength ≦193 nm'20077,172,055'Generating elevator or escalator installation fault log'20077,116,394'Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system'20067,090,362'Facet mirror having a number of mirror facets'20067,091,505'Collector with fastening devices for fastening mirror shells'20067,084,412'Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm'20067,015,489'Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm'20066,912,077'Optical system'20056,836,530'Illumination system with a plurality of individual gratings'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2011Patents assigned to ZEISS CARL SMT AG (19)· patent assignee history
2004–2009Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2004–2013Based in Aalen, DE· patent location history
2007Based in Aadorf, CH· patent location history
2009Patents assigned to ASML NETHERLANDS (1)· patent assignee history
2012–2016Patents assigned to WEISS MARKUS (4)· patent assignee history
2012–2013Patents assigned to ZEISS CARL SMT GMBH (4)· patent assignee history
2016Based in Bamberg, DE· patent location history
2018Based in Alteglofsheim, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 19 | 2004–2011 |
| WEISS MARKUSself | 4 | 2012–2016 |
| ZEISS CARL SMT GMBH | 4 | 2012–2013 |
| ASML NETHERLANDS BV | 2 | 2004–2009 |
| ASML NETHERLANDS | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 23 | 2004–2013 |
| Alteglofsheim, DE | 1 | 2018 |
| Bamberg, DE | 1 | 2016 |
| Aadorf, CH | 1 | 2007 |