Inventor
Fuping CHEN
Inventor
CN
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
B08BCleaning in general18%
G08BSignalling systems, e.g. personal calling systems6%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general5%
B01DSeparation3%
F04BPositive-displacement machines for liquids3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
Y02PClimate change mitigation technologies in the production or processing of goods2%
C25DProcesses for the electrolytic or electrophoretic production of coatings1%
PatentTitleYear
12,518,961Wafer backside cleaning method202612,494,360Apparatus and method for cleaning semiconductor wafers202512,482,697Substrate supporting apparatus202512,334,367Method and apparatus for removing particles or photoresist on substrates202512,186,684Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device202512,111,575Coater with automatic cleaning function and coater automatic cleaning method202412,100,586Substrate cleaning method and apparatus202412,068,149Apparatus and method for cleaning semiconductor wafers202412,062,556Methods and apparatus for cleaning semiconductor wafers202411,967,497Methods and apparatus for cleaning semiconductor wafers202411,955,328Method and apparatus for cleaning semiconductor wafer202411,925,881Method and apparatus for cleaning substrates using high temperature chemicals and ultrasonic device202411,911,808System for cleaning semiconductor wafers202411,911,807Method and apparatus for cleaning substrates202411,876,005Methods and apparatus for cleaning flip chip assemblies202411,854,842Substrate heat treatment apparatus202311,848,217Methods and apparatus for cleaning substrates202311,752,529Method for cleaning semiconductor wafers202311,638,937Methods and apparatus for cleaning substrates202311,633,765System for cleaning semiconductor wafers202311,629,425Method and apparatus for uniformly metallization on substrate202311,581,205Methods and system for cleaning semiconductor wafers202311,498,100Apparatus for cleaning semiconductor substrates202211,462,423Method and apparatus for cleaning semiconductor wafer202211,335,550Method and apparatus for cleaning semiconductor wafer202211,257,667Methods and apparatus for cleaning semiconductor wafers202211,141,762System for cleaning semiconductor wafers2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to ACM RESEARCH SHANGHAI INC (27)· patent assignee history
2021–2026Based in CN· patent location history
2023Patents assigned to ACM RES INC (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ACM RESEARCH SHANGHAI INC | 27 | 2021–2026 |
| ACM RES INC | 2 | 2023 |
Locations
| Location | Patents | Span |
|---|---|---|
| CN | 27 | 2021–2026 |