LexDanaLexDanabeta
Inventor

Byoung Ha Cho

Inventor
Daejeon, KR

Overview

3→
Patents
2006–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material30%
H01JElectric discharge tubes or discharge lamps20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C30BSingle-crystal growth10%
H01LSemiconductor devices10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
PatentTitleYear
10,233,542Apparatus for treating substrate and method for treating substrate20197,435,445'Method for manufacturing semiconductor device'20087,077,904'Method for atomic layer deposition (ALD) of silicon oxide film'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
2006–2019Based in Daejeon, KR· patent location history
2008Patents assigned to MOOHAN CO LTD (1)· patent assignee history
2019Patents assigned to JUSUNG ENG CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JUSUNG ENG CO LTD12019
MOOHAN CO LTD12008
SAMSUNG ELECTRONICS CO LTD12006
Locations
LocationPatentsSpan
Daejeon, KR32006–2019