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Inventor

MARCEL MARIA CORNELIUS FRANCISCUS TEUNISSEN

Inventor
NL

Overview

4→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
12,321,104Substrate holder for use in a lithographic apparatus202511,860,546Fluid handling structure for lithographic apparatus202411,454,892Fluid handling structure for lithographic apparatus202211,448,976Substrate holder for use in a lithographic apparatus2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2022–2025Patents assigned to ASML HOLDING NV (2)· patent assignee history
2022–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42022–2025
ASML HOLDING NV22022–2025
Locations
LocationPatentsSpan
NL42022–2025