Inventor
Nicholas J. Clecak
Inventor
San Jose, CA, US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices64%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein18%
C07DHeterocyclic compounds9%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
PatentTitleYear
6,277,546'Process for imaging of photoresist'20015,322,765'Dry developable photoresist compositions and method for use thereof'19944,601,969'High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution'19864,585,310'Alignment layer orientation in raster scan thermally addressed smectic liquid crystal displays'19864,522,911'Deep ultra-violet lithographic resists with diazohomotetramic acid compounds'19854,397,937'Positive resist compositions'19834,339,522'Ultra-violet lithographic resist composition and process'19824,284,706'Lithographic resist composition for a lift-off process'19814,139,276'Electrochromic display devices comprising substituted fluorene compounds'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979–2001Patents assigned to IBM (9)· patent assignee history
1979–2001Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 9 | 1979–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 9 | 1979–2001 |