Inventor
Nobuyuki Kuboi
Inventor
Kanagawa, JP
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G06FElectric digital data processing13%
H01JElectric discharge tubes or discharge lamps12%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
H04NPictorial communication, e.g. television6%
C23CCoating metallic material3%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
10,998,174Dry etching equipment and method for producing semiconductor device202110,929,579Film formation simulation method, program, and semiconductor processing system202110,821,260State control apparatus, state control method, and state control system202010,790,125Damage prediction method and semiconductor processing system202010,534,355Information processing device, processing device, prediction method, and processing method202010,403,516Etching characteristic estimation method, program, information processing apparatus, processing apparatus, designing method, and production method201910,361,230Imaging element, method for manufacturing imaging element, pixel design method, and electronic apparatus with light collecting parts having plural projection and depression structures201910,074,517Plasma treatment method, plasma treatment apparatus, and semiconductor device manufacturing method20189,881,104'Simulating shape of a workpiece based on a flux'20189,881,107'Simulation method, simulation program, processing apparatus, simulator, and design method'20189,666,623'Imaging element, method for manufacturing imaging element, pixel design method, and electronic apparatus with light collecting parts having plural projection and depression structures'20179,609,228'Solid-state image pickup device with transmittance control element'20179,437,636'Solid-state imaging element, manufacturing method, and electronic device'20169,431,310'Simulation method, simulation program, process control system, simulator, process design method, and mask design method'20169,411,914'Simulator, processing system, damage evaluation method and damage evaluation program'20169,287,097'Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing process'20169,189,577'Simulation method, simulation program, processing unit, and simulator'20158,958,073'Imaging apparatus, electronic apparatus, photovoltaic cell, and method of manufacturing imaging apparatus'20158,845,913'Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method'20148,829,410'Solid-state imaging device, manufacturing method thereof, and electronic apparatus'20148,759,738'Imaging element having plural light collecting parts each including a specific projection and depression structure, method for manufacturing imaging element, pixel design method, and electronic apparatus'20148,747,685'Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production method'20148,649,893'Semiconductor manufacturing device, semiconductor device manufacturing method, simulation device, and simulation program'20148,618,460'Solid-state imaging device, manufacturing method thereof, and electronic apparatus'20138,545,710'Ion radiation damage prediction method, ion radiation damage simulator, ion radiation apparatus and ion radiation method'20138,535,550'Shape simulation apparatus, shape simulation program, semiconductor production apparatus, and semiconductor device production method'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2021Patents assigned to SONY CORP (20)· patent assignee history
2013–2021Patents assigned to KUBOI NOBUYUKI (9)· patent assignee history
2013–2021Patents assigned to TATSUMI TETSUYA (4)· patent assignee history
2013–2021Based in Kanagawa, JP· patent location history
2013–2021Based in Tokyo, JP· patent location history
2018–2021Patents assigned to SONY SEMICONDUCTOR SOLUTIONS CORP (6)· patent assignee history
2018Patents assigned to FUKUSAWA MASANAGA (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 20 | 2013–2021 |
| KUBOI NOBUYUKIself | 9 | 2013–2021 |
| SONY SEMICONDUCTOR SOLUTIONS CORP | 6 | 2018–2021 |
| TATSUMI TETSUYA | 4 | 2013–2021 |
| FUKUSAWA MASANAGA | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 19 | 2013–2021 |
| Tokyo, JP | 7 | 2013–2021 |