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Inventor

Gijsbert RISPENS

Inventor
NL

Overview

4→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G02BOptical elements, systems or apparatus33%
PatentTitleYear
12,474,629Membrane for EUV lithography202511,822,255Process window based on defect probability202311,762,281Membrane for EUV lithography202311,415,886Lithographic patterning process and resists to use therein2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2025Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2022–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV42022–2025
Locations
LocationPatentsSpan
NL42022–2025