Inventor
Yoshiyuki Utsumi
Inventor
Kawasaki, JP
Overview
Patents· 75 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
C07CAcyclic or carbocyclic compounds14%
C07DHeterocyclic compounds11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium1%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
PatentTitleYear
11,048,166Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition202110,216,084Sulfonic acid derivative, photoacid generator using same, resist composition, and device manufacturing method20199,862,695'Monomer having N-acyl carbamoyl group and lactone skeleton, and polymeric compound'20189,778,567'Resist composition, method of forming resist pattern, polymeric compound, compound'20179,644,110'Method of producing structure containing phase-separated structure and method of forming top coat film'20179,618,842'Resist composition and method of forming resist pattern'20179,606,433'Resist composition, method of forming resist pattern, polymeric compound and compound'20179,567,477'Undercoat agent and method of producing structure containing phase-separated structure'20179,499,646'Negative resist composition, method of forming resist pattern and complex'20169,469,712'Method of producing polymeric compound, resist composition and method of forming resist pattern'20169,442,371'Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern'20169,383,642'Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern'20169,366,960'Negative resist composition, method of forming resist pattern, and complex'20169,354,515'Resist composition, acid generator, polymeric compound and method of forming resist pattern'20169,244,347'Resist composition, compound, polymeric compound and method of forming resist pattern'20169,206,307'Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern'20159,188,869'Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern'20159,188,863'Resist composition and method of forming resist pattern'20159,164,379'Resist composition, method for forming resist pattern, and compound'20159,164,380'Resist composition and method of forming resist pattern'20159,133,102'Resist composition, method of forming resist pattern and polymeric compound'20159,122,157'Resist composition and method for forming resist pattern'20159,097,971'Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern'20159,097,969'Compound, resist composition and method of forming resist pattern'20159,091,916'Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal'20159,091,915'Resist composition, method of forming resist pattern, polymeric compound and method of producing polymeric compound'20159,075,304'Method of producing ammonium salt compound, method of producing compound, and compound, polymeric compound, acid generator, resist composition and method of forming resist pattern'20159,063,416'Resist composition, method of forming resist pattern and compound'20159,045,398'Sulfonium salt and photo-acid generator'20159,040,220'Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern'20159,034,556'Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern'20159,023,581'Resist composition, method of forming resist pattern, polymeric compound, and compound'20159,017,924'Resist composition, method of forming resist pattern, polymeric compound and compound'20159,017,919'Resist composition, method of forming resist pattern, novel compound and acid generator'20159,012,129'Resist composition, method of forming resist pattern, novel compound, and acid generator'20159,005,874'Compound, polymeric compound, acid generator, resist composition, and method of forming resist pattern'20158,987,386'Method of producing polymeric compound, resist composition, and method of forming resist pattern'20158,932,795'Resist composition, method of forming resist pattern, novel compound, and acid generator'20158,900,795'Resist composition, method of forming resist pattern and novel compound'20148,900,788'Resist composition for immersion exposure and method of forming resist pattern'20148,846,291'Resist composition, method of forming resist pattern, and new compound'20148,808,959'Resist composition, method of forming resist pattern, novel compound, and acid generator'20148,778,595'Resist composition, method of forming resist pattern, and polymeric compound'20148,765,352'Resist composition, method of forming resist pattern, novel compound, and acid generator'20148,765,354'Resist composition for negative development and method of forming resist pattern'20148,703,387'Resist composition, method of forming resist pattern, novel compound, and acid generator'20148,685,620'Resist composition, method of forming resist pattern and polymeric compound'20148,614,049'Resist composition and method of forming resist pattern'20138,609,320'Resist composition, method of forming resist pattern, polymeric compound and compound'20138,541,157'Resist composition, method of forming resist pattern, compound and acid generator including the same'20138,535,868'Positive resist composition and method of forming resist pattern'20138,519,073'Compound and polymeric compound'20138,497,395'Compound'20138,415,085'Resist composition, method of forming resist pattern, novel compound, and acid generator'20138,415,082'Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator'20138,367,297'Resist composition, method of forming resist pattern, novel compound and acid generator'20138,367,299'Resist composition, method of forming resist pattern, compound and acid generator'20138,338,076'Resist composition, method of forming resist pattern, novel compound, and acid generator'20128,298,748'Positive resist composition, method of forming resist pattern, and polymeric compound'20128,268,530'Positive resist composition, method of forming resist pattern, polymeric compound, and compound'20128,252,505'Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern'20128,252,509'Resist composition and method of forming resist pattern'20128,247,160'Resist composition, method of forming resist pattern, and novel compound and acid generator'20128,227,169'Compound, acid generator, resist composition, and method of forming resist pattern'20128,211,616'Positive resist composition and method of forming resist pattern'20128,206,890'Resist composition, method of forming resist pattern, compound and acid generator'20128,206,891'Positive resist composition and method of forming resist pattern'20128,124,313'Resist composition, method of forming resist pattern, novel compound, and acid generator'20128,105,747'Positive resist composition and method of forming resist pattern'20127,955,777'Compound, acid generator, resist composition and method of forming resist pattern'20117,799,507'Positive resist composition for immersion lithography and method for forming resist pattern'20107,713,679'Resist composition, method of forming resist pattern, novel compound, and acid generator'20107,682,772'Resist composition, method of forming resist pattern, novel compound, and acid generator'20105,146,103'Cruise control apparatus for a vehicle'19925,085,287'Cruise control apparatus for a vehicle'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992Based in Himeji, JP· patent location history
2010–2018Patents assigned to TOKYO OHKA KOGYO CO LTD (71)· patent assignee history
2010–2018Based in Kawasaki, JP· patent location history
2012–2017Patents assigned to UTSUMI YOSHIYUKI (37)· patent assignee history
2012–2015Patents assigned to KAWAUE AKIYA (18)· patent assignee history
2012–2015Patents assigned to SESHIMO TAKEHIRO (13)· patent assignee history
2012–2015Patents assigned to SHIMIZU HIROAKI (13)· patent assignee history
2015Based in Kanagawa, JP· patent location history
2019Based in Ichikawa, JP· patent location history
2021Based in Chiba, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 71 | 2010–2018 |
| UTSUMI YOSHIYUKIself | 37 | 2012–2017 |
| KAWAUE AKIYA | 18 | 2012–2015 |
| SESHIMO TAKEHIRO | 13 | 2012–2015 |
| SHIMIZU HIROAKI | 13 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 70 | 2010–2018 |
| Himeji, JP | 2 | 1992 |
| Chiba, JP | 1 | 2021 |
| Ichikawa, JP | 1 | 2019 |
| Kanagawa, JP | 1 | 2015 |