Inventor
Ichiro Takemura
Inventor
Kanagawa, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices19%
H10KOrganic electric solid-state devices19%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution19%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation12%
C07DHeterocyclic compounds7%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium7%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments7%
H04NPictorial communication, e.g. television5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
Y10TTechnical subjects covered by former us classification2%
PatentTitleYear
11,107,849Photoelectric conversion element, imaging device, and electronic apparatus to improve photoresponse while maintaining superior wavelenght selectivity of a subphthalocyanine and a subphthalocyanine derivative202111,056,539Photoelectric conversion element and solid-state imaging device202111,018,308Photoelectric conversion film, photoelectric conversion element and electronic device202110,727,262Photoelectric conversion element, imaging device, and electronic apparatus comprising a photoelectric conversion layer having at least a subphthalocyanine or a subphthalocyanine derivative and a carrier dopant202010,672,994Photoelectric conversion film, photoelectric conversion element and electronic device202010,522,772Photoelectric conversion element and solid-state imaging apparatus201910,374,015Photoelectric conversion element and solid-state imaging device201910,312,457Photoelectric conversion film, photoelectric conversion element and electronic device20198,697,342'Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2021Patents assigned to SONY CORP (3)· patent assignee history
2014Patents assigned to MATSUI ERIKO (1)· patent assignee history
2014Patents assigned to MATSUZAWA NOBUYUKI (1)· patent assignee history
2014Patents assigned to MITA ISAO (1)· patent assignee history
2014–2021Based in Kanagawa, JP· patent location history
2019–2021Patents assigned to SONY SEMICONDUCTOR SOLUTIONS CORP (6)· patent assignee history
2021Based in Yokohama-shi, Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY SEMICONDUCTOR SOLUTIONS CORP | 6 | 2019–2021 |
| SONY CORP | 3 | 2014–2021 |
| MATSUI ERIKO | 1 | 2014 |
| MATSUZAWA NOBUYUKI | 1 | 2014 |
| MITA ISAO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 8 | 2014–2021 |
| Yokohama-shi, Kanagawa, JP | 1 | 2021 |