Inventor

Keiichi Enjoji

Inventor

Tokyo, JP

Overview

2007–2010

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Bprimary

B81BMicrostructural devices or systems, e.g. micromechanical devices11%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems11%

B82YSpecific uses or applications of nanostructures11%

C23CCoating metallic material11%

C30BSingle-crystal growth11%

G01CMeasuring distances, levels or bearings11%

G01NInvestigating or analysing materials by determining their chemical or physical properties11%

G01PMeasuring linear or angular speed, acceleration, deceleration, or shock11%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2007–2010Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history

2007–2010Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	2	2007–2010

Locations

Location	Patents	Span
Tokyo, JP	2	2007–2010