LexDanaLexDanabeta
Inventor

MARTIJN MARIA ZAAL

Inventor
NL

Overview

2→
Patents
2023
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G06FElectric digital data processing25%
G01BMeasuring length, thickness or similar linear dimensions13%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
PatentTitleYear
11,710,668Method and apparatus to determine a patterning process parameter202311,604,419Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2023Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22023
Locations
LocationPatentsSpan
NL22023