Inventor

Hisaji Matsui

Inventor

Osaka, JP

Overview

2005–2007

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary

B01DSeparation11%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry11%

B82BNanostructures formed by manipulation of individual atoms, molecules, or limited collections of atoms or molecules as discrete units11%

B82YSpecific uses or applications of nanostructures11%

C01BNon-metallic elements11%

F17CVessels for containing or storing compressed, liquefied or solidified gases11%

G01NInvestigating or analysing materials by determining their chemical or physical properties11%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution11%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2005–2007Patents assigned to OSAKA GAS CO LTD (2)· patent assignee history

2005Based in Nara, JP· patent location history

2007Based in Osaka, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
OSAKA GAS CO LTD	2	2005–2007

Locations

Location	Patents	Span
Osaka, JP	1	2007
Nara, JP	1	2005