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Inventor

Alexander Hendrik Vincent Van Veen

Inventor
Rotterdam, NL

Overview

23→
Patents
2005–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps49%
B82YSpecific uses or applications of nanostructures45%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G21KHandling of particles or ionising radiation not otherwise provided for2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
PatentTitleYear
10,586,625Vacuum chamber arrangement for charged particle beam generator202010,037,864High voltage shielding and cooling in a charged particle beam generator20189,653,261'Charged particle lithography system and beam generator'20179,208,989'Lithography system and method of refracting'20159,105,439'Projection lens arrangement'20158,921,758'Modulation device and charged particle multi-beamlet lithography system using the same'20148,890,094'Projection lens arrangement'20148,841,636'Modulation device and charged particle multi-beamlet lithography system using the same'2014RE045049'Electron beam exposure system'20148,759,787'Charged particle multi-beamlet lithography system with modulation device'2014RE044908'Electron beam exposure system'20148,653,485'Projection lens arrangement'20148,618,496'Charged particle system comprising a manipulator device for manipulation of one or more charged particle beams'20138,604,411'Charged particle beam modulator'20138,558,196'Charged particle lithography system with aperture array cooling'20138,502,176'Imaging system'20138,492,731'Charged particle multi-beamlet lithography system with modulation device'2013RE044240'Electron beam exposure system'20138,445,869'Projection lens arrangement'20138,258,484'Beamlet blanker arrangement'20128,089,056'Projection lens arrangement'20127,091,504'Electron beam exposure system'20066,897,458'Electron beam exposure system'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2018Patents assigned to MAPPER LITHOGRAPHY IP BV (22)· patent assignee history
2005–2006Based in Delft, NL· patent location history
2012–2015Patents assigned to VAN VEEN ALEXANDER HENDRIK VINCENT (14)· patent assignee history
2012–2015Patents assigned to KRUIT PIETER (6)· patent assignee history
2012–2014Patents assigned to STEENBRINK STIJN WILLEM HERMAN KAREL (6)· patent assignee history
2012–2020Based in Rotterdam, NL· patent location history
2013–2014Patents assigned to WIELAND MARCO JAN-JACO (12)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MAPPER LITHOGRAPHY IP BV222005–2018
VAN VEEN ALEXANDER HENDRIK VINCENTself142012–2015
WIELAND MARCO JAN-JACO122013–2014
KRUIT PIETER62012–2015
STEENBRINK STIJN WILLEM HERMAN KAREL62012–2014
Locations
LocationPatentsSpan
Rotterdam, NL212012–2020
Delft, NL22005–2006