Inventor

Liang-Guang Chen

Inventor
Hsinchu, TW

Overview

37→
Patents
2006–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 37 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
H10DInorganic electric semiconductor devices15%
B24BMachines, devices, or processes for grinding or polishing10%
B08BCleaning in general4%
A46BBrushes2%
B24DTools for grinding, buffing or sharpening2%
C09GPolishing compositions2%
C09KMaterials for miscellaneous applications, not provided for elsewhere1%
PatentTitleYear
10,847,359Method for metal gate surface clean202010,755,934Systems and methods for chemical mechanical polish and clean202010,692,732CMP slurry and CMP method202010,636,701Methods of forming semiconductor devices using multiple planarization processes202010,515,808Systems and methods for chemical mechanical polish and clean201910,510,601Method for reducing metal plug corrosion and device201910,504,782Fin Field-Effect Transistor device and method of forming the same201910,269,555Post-CMP cleaning and apparatus201910,157,781Method for forming semiconductor structure using polishing process201810,062,645Interconnect structure for semiconductor devices20189,987,720Method for operating a polishing head and method for polishing a substrate20189,962,805Chemical mechanical polishing apparatus and method20189,917,173'Oxidation and etching post metal gate CMP'20189,768,064'Formation method of semiconductor device structure'20179,723,915'Brush cleaning method'20179,679,848'Interconnect structure for semiconductor devices'20179,633,832'Method for metal gate surface clean'20179,630,295'Mechanisms for removing debris from polishing pad'20179,564,511'Oxidation and etching post metal gate CMP'20179,553,161'Mechanism for forming metal gate structure'20179,460,997'Interconnect structure for semiconductor devices'20169,449,841'Methods and systems for chemical mechanical polish and clean'20169,352,443'Platen assembly, chemical-mechanical polisher, and method for polishing substrate'20169,305,880'Interconnects for semiconductor devices'20169,272,386'Polishing head, and chemical-mechanical polishing system for polishing substrate'20169,269,585'Method for cleaning metal gate surface'20169,252,060'Reduction of OCD measurement noise by way of metal via slots'20169,209,272'Oxidation and etching post metal gate CMP'20159,209,040'Amorphorus silicon insertion for STI-CMP planarity improvement'20159,119,464'Brush cleaning system'20159,076,766'Mechanism for forming metal gate structure'20158,975,179'Planarization process for semiconductor device fabrication'20158,703,612'Process for forming contact plugs'20148,598,028'Gate height loss improvement for a transistor'20138,348,719'Polisher for chemical mechanical planarization'20138,021,566'Method for pre-conditioning CMP polishing pad'20117,105,446'Apparatus for pre-conditioning CMP polishing pad'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (10)· patent assignee history
2006–2011Based in Yilan County, TW· patent location history
2013–2016Patents assigned to CHEN LIANG-GUANG (6)· patent assignee history
2013–2015Patents assigned to CHEN YING-TSUNG (2)· patent assignee history
2013–2015Patents assigned to HONG WEILUN (2)· patent assignee history
2013–2020Based in Hsinchu, TW· patent location history
2015–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (27)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG CO LTD272015–2020
TAIWAN SEMICONDUCTOR MFG102006–2016
CHEN LIANG-GUANGself62013–2016
CHEN YING-TSUNG22013–2015
HONG WEILUN22013–2015
Locations
LocationPatentsSpan
Hsinchu, TW352013–2020
Yilan County, TW22006–2011