Inventor

JAMES ROGERS

Inventor
US

Overview

60→
Patents
2021–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 60 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H01LSemiconductor devices14%
A23BPreservation of foods, foodstuffs or non-alcoholic beverages4%
LOC024%
A01NPreservation of bodies of humans or animals or plants or parts thereof3%
C09DCoating compositions, e.g. paints, varnishes or lacquers3%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for2%
A23VIndexing scheme relating to foods, foodstuffs or non-alcoholic beverages and lactic or propionic acid bacteria used in foodstuffs or food preparation2%
C23CCoating metallic material2%
PatentTitleYear
12,580,162Temperature and bias control of edge ring202612,577,951Electric compressor with scroll backpressure system2026D1115179Protective helmet2026D1114360Protective helmet202612,525,433Method and apparatus to reduce feature charging in plasma processing chamber202612,525,441Plasma chamber and chamber component cleaning methods202612,482,633Apparatus and method for delivering a plurality of waveform signals during plasma processing2025D1091951Protective helmet202512,394,596Plasma uniformity control in pulsed DC plasma chamber202512,334,311Circuits for edge ring control in shaped dc pulsed plasma process device202512,277,697Produce quality assessment and pricing metric system202512,251,507Aerosol delivery device with condensing and non-condensing vaporization202512,255,051Multi-shape voltage pulse trains for uniformity and etch profile tuning202512,237,148Plasma processing assembly using pulsed-voltage and radio-frequency power2025D1063223Protective helmet202512,215,959Ballistic-resistant curved molded article202512,217,938To an inductively coupled plasma source202512,183,557Apparatus and methods for controlling ion energy distribution202412,173,192Precursor compounds for molecular coatings202412,148,595Plasma uniformity control in pulsed DC plasma chamber202412,057,292Feedback loop for controlling a pulsed voltage waveform202411,984,306Plasma chamber and chamber component cleaning methods202411,948,780Automatic electrostatic chuck bias compensation during plasma processing202411,908,661Apparatus and methods for manipulating power at an edge ring in plasma process device202411,901,157Apparatus and methods for controlling ion energy distribution202411,864,615Helmet with shock absorbing inserts202411,844,390Helmet with shock absorbing inserts202311,848,176Plasma processing using pulsed-voltage and radio-frequency power2023D1004850Protective helmet202311,812,758Plant extract compositions and methods of preparation thereof202311,810,768Temperature and bias control of edge ring202311,798,790Apparatus and methods for controlling ion energy distribution202311,791,138Automatic electrostatic chuck bias compensation during plasma processing202311,776,789Plasma processing assembly using pulsed-voltage and radio-frequency power202311,767,278Plant extract compositions for forming protective coatings202311,723,377Method for preparing and preserving sanitized products2023D0995925Protective helmet202311,728,124Creating ion energy distribution functions (IEDF)2023D0995924Protective helmet202311,699,572Feedback loop for controlling a pulsed voltage waveform202311,694,876Apparatus and method for delivering a plurality of waveform signals during plasma processing202311,610,759Gas splitting by time average injection into different zones by fast gas valves202311,596,749Aerosol precursor composition mixing system for an aerosol delivery device202311,551,916Sheath and temperature control of a process kit in a substrate processing chamber202311,521,828Inductively coupled plasma source202211,508,554High voltage filter assembly202211,493,309Ballistic-resistant molded article202211,476,145Automatic ESC bias compensation when using pulsed DC bias202211,472,970Precursor compounds for molecular coatings202211,462,389Pulsed-voltage hardware assembly for use in a plasma processing system202211,462,388Plasma processing assembly using pulsed-voltage and radio-frequency power202211,447,646Precursor compounds for molecular coatings202211,367,593Apparatus and methods for manipulating radio frequency power at an edge ring in plasma process device202211,291,782Aerosol precursor composition mixing system for an aerosol delivery device202211,289,310Circuits for edge ring control in shaped DC pulsed plasma process device202211,284,500Method of controlling ion energy distribution using a pulse generator202211,276,601Apparatus and methods for manipulating power at an edge ring in a plasma processing device202211,232,933Temperature and bias control of edge ring202211,177,115Dual-level pulse tuning202111,160,287Plant extract compositions and methods of preparation thereof2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to APPLIED MATERIALS INC (37)· patent assignee history
2021–2025Patents assigned to APEEL TECH INC (8)· patent assignee history
2021–2026Based in US· patent location history
2022–2025Patents assigned to RAI STRATEGIC HOLDINGS INC (3)· patent assignee history
2023–2026Patents assigned to STUDSON INC (5)· patent assignee history
2023–2024Patents assigned to KOROYD SARL (2)· patent assignee history
2023–2026Based in GB· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC372021–2026
APEEL TECH INC82021–2025
STUDSON INC52023–2026
RAI STRATEGIC HOLDINGS INC32022–2025
KOROYD SARL22023–2024
Locations
LocationPatentsSpan
US512021–2026
GB92023–2026