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Inventor

Lalit Shokeen

Inventor
Clifton Park, NY, US

Overview

1→
Patents
2017
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G06FElectric digital data processing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
PatentTitleYear
9,817,927'Hard mask etch and dielectric etch aware overlap for via and metal layers'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to GLOBALFOUNDRIES INC (1)· patent assignee history
2017Based in Clifton Park, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
GLOBALFOUNDRIES INC12017
Locations
LocationPatentsSpan
Clifton Park, New York, US12017