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Inventor

Klaus J. Przybilla

Inventor
Frankfurt am Main, DE

Overview

2→
Patents
1996–1997
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
5,663,035'Radiation-sensitive mixture comprising a basic iodonium compound'19975,525,453'Positive-working radiation-sensitive mixture'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1997Patents assigned to HOECHST JAPAN (2)· patent assignee history
1996–1997Based in Frankfurt am Main, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOECHST JAPAN21996–1997
Locations
LocationPatentsSpan
Frankfurt am Main, DE21996–1997