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Inventor

Andrew David LaForge

Inventor
Poway, CA, US

Overview

2→
Patents
2021
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H05GX-ray technique50%
PatentTitleYear
10,955,749Guiding device and associated system202110,904,993Reducing the effect of plasma on an object in an extreme ultraviolet light source2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2021Based in Poway, CA, US· patent location history
2021Based in San Diego, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22021
Locations
LocationPatentsSpan
Poway, California, US12021
San Diego, California, US12021