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Inventor

Su Min Kim

Inventor
Suwon-si, KR

Overview

15→
Patents
2009–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H04LTransmission of digital information, e.g. telegraphic communication7%
H04WWireless communication networks7%
B41JTypewriters5%
H04NPictorial communication, e.g. television5%
H10BElectronic memory devices5%
H10DInorganic electric semiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
10,734,424Image sensing device202010,587,903Display apparatus and method of displaying content202010,522,682Semiconductor device201910,231,196Communication apparatus and method using random access procedure20199,837,272Methods of manufacturing semiconductor devices20179,788,344'System and method for random access based on spatial group'20179,773,672'Method of forming micropatterns'20179,570,304'Method of forming fine patterns in an anti-reflection layer for use as a patterning hard mask'20179,482,953'Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same'20169,158,204'Photo lithographic rinse solution and method of manufacturing a semiconductor device using the same'20158,982,809'Method and apparatus for resource management in a relay communication system, and method and apparatus for data relay using same'20158,877,634'Methods of forming a fine pattern on a substrate and methods of forming a semiconductor device having a fine pattern'20148,293,123'Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same'20128,163,463'Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head'20127,524,610'Oxetane-containing compound, photoresist composition having the same, method of preparing pattern using the photoresist composition, and inkjet print head including polymerization products of the oxetane-containing compound'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (11)· patent assignee history
2009–2020Based in Yongin-si, KR· patent location history
2012Patents assigned to KIM JIN-BAEK (2)· patent assignee history
2012Patents assigned to KIM SU-MIN (2)· patent assignee history
2012Patents assigned to PARK BYUNG-HA (2)· patent assignee history
2012–2019Based in Daejeon, KR· patent location history
2014–2019Based in Suwon-si, KR· patent location history
2015–2019Patents assigned to KOREA ADVANCED INST SCI & TECH (3)· patent assignee history
2017Based in Kyungki-do, KR· patent location history
2020Based in Namyangju-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD112009–2020
KOREA ADVANCED INST SCI & TECH32015–2019
KIM JIN-BAEK22012
KIM SU-MINself22012
PARK BYUNG-HA22012
Locations
LocationPatentsSpan
Suwon-si, KR62014–2019
Daejeon, KR32012–2019
Yongin-si, KR22009–2020
Namyangju-si, KR12020
Kyungki-do, KR12017