LexDanaLexDanabeta
Inventor

Ho Seung Chang

Inventor
Seoul, KR

Overview

3→
Patents
1998–2010
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
B08BCleaning in general13%
C23CCoating metallic material13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices13%
PatentTitleYear
7,842,606'Method of depositing thin film and method of manufacturing semiconductor using the same'20106,884,297'Thin film deposition reactor'20055,715,851'Wafer cassette and cleaning system adopting the same'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history
1998Based in Ansan-si, KR· patent location history
2005Patents assigned to IPS LTD (1)· patent assignee history
2005Based in Pyungtaek, KR· patent location history
2010Patents assigned to INTEGRATED PROCESS SYSTEMS LTD (1)· patent assignee history
2010Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INTEGRATED PROCESS SYSTEMS LTD12010
IPS LTD12005
SAMSUNG ELECTRONICS CO LTD11998
Locations
LocationPatentsSpan
Seoul, KR12010
Pyungtaek, KR12005
Ansan-si, KR11998