Inventor
Jeffrey Tobin
Inventor
Mountain View, CA, US
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices18%
H01JElectric discharge tubes or discharge lamps17%
C23CCoating metallic material14%
C30BSingle-crystal growth8%
B05DProcesses for applying fluent materials to surfaces, in general4%
G02BOptical elements, systems or apparatus3%
Y10TTechnical subjects covered by former us classification3%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling1%
H05BElectric heating1%
PatentTitleYear
10,837,122Method and apparatus for precleaning a substrate surface prior to epitaxial growth202010,626,500Showerhead design202010,535,513Apparatus and methods for backside passivation202010,529,541Inductive plasma source with metallic shower head using B-field concentrator202010,519,547Susceptor design to eliminate deposition valleys in the wafer201910,453,733Substrate transfer mechanisms201910,428,441Method and apparatus for precleaning a substrate surface prior to epitaxial growth201910,221,483Showerhead design201910,128,144Support cylinder for thermal processing chamber201810,049,881Method and apparatus for selective nitridation process20189,929,029'Substrate carrier system'20189,905,454'Substrate transfer mechanisms'20189,683,308'Method and apparatus for precleaning a substrate surface prior to epitaxial growth'20179,659,809'Support cylinder for thermal processing chamber'20179,558,982'Minimal contact edge ring for rapid thermal processing'20179,403,251'Minimal contact edge ring for rapid thermal processing'20169,385,004'Support cylinder for thermal processing chamber'20169,048,190'Methods and apparatus for processing substrates using an ion shield'20156,613,199'Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron'20036,589,398'Pasting method for eliminating flaking during nitride sputtering'20036,471,831'Apparatus and method for improving film uniformity in a physical vapor deposition system'20026,468,404'Apparatus and method for reducing redeposition in a physical vapor deposition system'20026,225,744'Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil'20016,200,412'Chemical vapor deposition system including dedicated cleaning gas injection'20015,619,103'Inductively coupled plasma generating devices'19975,511,143'Making polymer thin films for optical uses'19965,304,255'Photovoltaic cell with photoluminescent plasma polymerized film'19945,217,749'Method of making polymer thin films for optical uses'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1997Patents assigned to WISCONSIN ALUMNI RES FOUND (3)· patent assignee history
1993–1996Based in Madison, WI, US· patent location history
1997Based in Santa Fe, NM, US· patent location history
2001–2003Patents assigned to NOVELLUS SYSTEMS INC (6)· patent assignee history
2001–2020Based in Mountain View, CA, US· patent location history
2015–2020Patents assigned to APPLIED MATERIALS INC (18)· patent assignee history
2018Patents assigned to BEVAN MALCOLM J (1)· patent assignee history
2018Patents assigned to CURTIS ROGER (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 18 | 2015–2020 |
| NOVELLUS SYSTEMS INC | 6 | 2001–2003 |
| WISCONSIN ALUMNI RES FOUND | 3 | 1993–1997 |
| BEVAN MALCOLM J | 1 | 2018 |
| CURTIS ROGER | 1 | 2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mountain View, California, US | 24 | 2001–2020 |
| Madison, WI, US | 3 | 1993–1996 |
| Santa Fe, NM, US | 1 | 1997 |