Inventor

Keiko Chiba

Inventor

Utsunomiya, JP

Overview

35→

Patents

1988–2020

Patent span

Physics

Primary field (CPC G)

Patents· 35 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%

B29CShaping or joining of plastics7%

G02BOptical elements, systems or apparatus6%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

B82YSpecific uses or applications of nanostructures5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

G21KHandling of particles or ionising radiation not otherwise provided for5%

B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%

B29LIndexing scheme associated with subclass b29c, relating to particular articles4%

C08LCompositions of macromolecular compounds4%

PatentTitleYear

10,856,422Method of forming pattern on a substrate2020 10,845,700Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold2020 10,754,245Pattern forming method as well as production methods for processed substrate, optical component, circuit board, electronic component and imprint mold2020 10,456,974Photocurable composition, methods for producing film, optical component, circuit board, and electronic component by using the same, and cured product2019 10,293,543Method of producing a patterned film2019 9,957,340Imprinting method and curable composition for imprinting2018 7,916,273'Exposure apparatus and device manufacturing method'2011 7,072,438'Reflection type mask'2006 7,027,227'Three-dimensional structure forming method'2006 6,829,091'Optical system and optical instrument with diffractive optical element'2004 6,728,332'X-ray mask, and exposure method and apparatus using the same'2004 6,723,475'Reflection-type mask for use in pattern exposure, manufacturing method therefor, exposure apparatus, and method of manufacturing a device'2004 6,645,707'Device manufacturing method'2003 6,627,468'Method for manufacturing optical element, optical element, optical system using optical element, optical apparatus and exposure apparatus using optical system, and method for manufacturing device'2003 6,605,392'X-ray mask structure, and X-ray exposure method and apparatus using the same'2003 6,455,203'Mask structure and method of manufacturing the same'2002 6,449,332'Exposure apparatus, and device manufacturing method'2002 6,418,187'X-ray mask structure, and X-ray exposure method and apparatus using the same'2002 6,337,161'Mask structure exposure method'2002 6,317,479'X-ray mask, and exposure method and apparatus using the same'2001 6,272,202'Exposure method and X-ray mask structure for use with the same'2001 6,101,237'X-ray mask and X-ray exposure method using the same'2000 6,087,076'Method of manufacturing semiconductor devices by performing coating, heating, exposing and developing in a low-oxygen or oxygen free controlled environment'2000 5,952,149'Resist solution for photolithography including a base resin and an oxygen-free or low-oxygen solvent'1999 5,882,826'Membrane and mask, and exposure apparatus using the mask, and device producing method using the mask'1999 5,870,448'X-ray mask and fabrication process using it'1999 5,846,676'Mask structure and exposure method and apparatus using the same'1998 5,770,335'Mask and exposure apparatus using the same'1998 5,733,688'Lithographic mask structure and method of producing the same comprising W and molybdenum alloy absorber'1998 5,656,398'Method of making X-ray mask structure'1997 5,589,304'Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond'1996 5,553,110'X-ray mask structure, process for production thereof, apparatus and method for X-ray exposure with the X-ray mask structure, and semiconductor device produced by the X-ray exposure method'1996 5,422,921'X-ray mask structure and manufacturing methods including forming a metal oxide film on a portion of an X-ray permeable film having no X-ray absorber thereon'1995 4,764,528'2,4-pentadienoic acid derivatives and platelet aggregation inhibitors containing the same'1988 4,735,877'Lithographic mask structure and lithographic process'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2020Patents assigned to CANON KK (34)· patent assignee history

1988Patents assigned to TERUMO CORP (1)· patent assignee history

1988–1997Based in Isehara, JP· patent location history

1988Based in Tsuchiura, JP· patent location history

1998–2020Based in Utsunomiya, JP· patent location history

2003–2006Based in Tochigi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	34	1988–2020
TERUMO CORP	1	1988

Locations

Location	Patents	Span
Utsunomiya, JP	26	1998–2020
Isehara, JP	5	1988–1997
Tochigi, JP	3	2003–2006
Tsuchiura, JP	1	1988