Inventor
Ryoji Nishio
Inventor
Kudamatsu, JP
Overview
Patents· 42 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps41%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
C23CCoating metallic material8%
C23FNon-mechanical removal of metallic material from surface4%
G06FElectric digital data processing3%
H05HPlasma technique3%
B44CProducing decorative effects2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
H10NElectric solid-state devices not otherwise provided for2%
G11BInformation storage based on relative movement between record carrier and transducer1%
PatentTitleYear
10,998,168Plasma processing apparatus202110,541,115Plasma processing apparatus202010,262,835Plasma processing equipment and plasma generation equipment201910,229,813Plasma processing apparatus with lattice-like faraday shields20199,805,915'Plasma processing apparatus'20179,566,821'Plasma processing apparatus and plasma processing method'20179,039,865'Plasma processing apparatus'20158,940,128'Plasma processing apparatus'20158,906,196'Plasma processing apparatus and method for controlling the same'20148,795,467'Plasma processing apparatus and method'20148,632,637'Method and apparatus for plasma processing'20148,425,786'Plasma etching method and plasma etching apparatus'20138,366,870'Method and apparatus for plasma processing'20138,329,054'Plasma processing apparatus and plasma processing method'20128,186,300'Plasma processing apparatus'20128,083,889'Apparatus and method for plasma etching'20118,062,473'Plasma processing apparatus and method'20118,057,634'Method and apparatus for plasma processing'20117,892,444'Plasma processing apparatus and method for controlling the same'20117,833,429'Plasma processing method'20107,740,739'Plasma processing apparatus and method'20107,713,756'Apparatus and method for plasma etching'20107,183,715'Method for operating a semiconductor processing apparatus'20077,138,606'Wafer processing method'20066,967,109'Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units'20056,895,179'Wafer stage for wafer processing apparatus'20056,846,363'Plasma processing apparatus and method'20056,835,665'Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method'20046,833,051'Plasma processing apparatus and method'20046,825,617'Semiconductor processing apparatus'20046,771,481'Plasma processing apparatus for processing semiconductor wafer using plasma'20046,759,253'Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units'20046,747,239'Plasma processing apparatus and method'20046,716,301'Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe'20046,646,233'Wafer stage for wafer processing apparatus and wafer processing method'20036,590,179'Plasma processing apparatus and method'20036,499,424'Plasma processing apparatus and method'20026,481,370'Plasma processsing apparatus'20026,245,202'Plasma treatment device'20016,180,019'Plasma processing apparatus and method'20016,172,321'Method and apparatus for plasma processing apparatus'20016,034,346'Method and apparatus for plasma processing apparatus'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2005Patents assigned to HITACHI LTD (14)· patent assignee history
2000–2021Based in Kudamatsu, JP· patent location history
2001–2005Based in Mito, JP· patent location history
2003–2021Patents assigned to HITACHI HIGH TECH CORP (28)· patent assignee history
2011–2020Patents assigned to NISHIO RYOJI (13)· patent assignee history
2011–2015Patents assigned to YOSHIOKA KEN (5)· patent assignee history
2011–2014Patents assigned to KANEKIYO TADAMITSU (4)· patent assignee history
2019Based in Yamaguchi, JP· patent location history
2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 28 | 2003–2021 |
| HITACHI LTD | 14 | 2000–2005 |
| NISHIO RYOJIself | 13 | 2011–2020 |
| YOSHIOKA KEN | 5 | 2011–2015 |
| KANEKIYO TADAMITSU | 4 | 2011–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kudamatsu, JP | 28 | 2000–2021 |
| Mito, JP | 12 | 2001–2005 |
| Yamaguchi, JP | 1 | 2019 |
| Tokyo, JP | 1 | 2019 |