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Inventor

Wasaburo Kawai

Inventor
Kawanishi, JP

Overview

2→
Patents
1978–1985
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds25%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds25%
PatentTitleYear
4,560,640'Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof'19854,108,844'Photosensitive polyesters'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1985Patents assigned to AGENCY IND SCIENCE TECHN (2)· patent assignee history
1978Based in Nishinomiya, JP· patent location history
1985Patents assigned to SANBO CHEMICAL IND CO LTD (1)· patent assignee history
1985Based in Kawanishi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AGENCY IND SCIENCE TECHN21978–1985
SANBO CHEMICAL IND CO LTD11985
Locations
LocationPatentsSpan
Kawanishi, JP11985
Nishinomiya, JP11978