Inventor

Hiroshi Mohri

Inventor

Tokyo, JP

Overview

1979–2020

Patent span

Physics

Primary field (CPC G)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%

G03GElectrography7%

G06KGraphical data reading7%

G09FDisplaying7%

G11BInformation storage based on relative movement between record carrier and transducer7%

H04NPictorial communication, e.g. television7%

Y10TTechnical subjects covered by former us classification7%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%

B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%

PatentTitleYear

10,634,990Photomask and methods for manufacturing and correcting photomask2020 10,394,118Photomask and methods for manufacturing and correcting photomask2019 10,048,580Photomask and methods for manufacturing and correcting photomask2018 9,519,211'Photomask and methods for manufacturing and correcting photomask'2016 8,974,987'Photomask and methods for manufacturing and correcting photomask'2015 8,124,301'Gradated photomask and its fabrication process'2012 6,764,792'Halftone phase shift photomask and blanks for halftone phase shift photomask for producing it'2004 6,709,791'Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using this'2004 6,493,013'Method for recording and reproducing information, apparatus therefor and recording medium'2002 6,458,496'Blank for halftone phase shift photomask and halftone phase shift photomask'2002 5,983,057'Color imaging system with selectively openable optical shutter'1999 5,972,543'Phase shift mask and method of producing the same'1999 5,916,712'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same'1999 5,811,208'Phase shift mask and method of producing the same'1998 5,738,959'Halftone phase shift photomask, halftone phase shift photomask blank, and method of producing the same comprising fluorine in phase shift layer'1998 5,721,075'Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them'1998 5,708,062'Bitumen compositions'1998 5,638,103'Method for recording and reproducing information, apparatus therefor and recording medium'1997 5,614,335'Blanks for halftone phase shift photomasks, halftone phase shift photomasks, and methods for fabricating them'1997 5,576,123'Overlying shifter type phase shift photomask blank, overlying shifter type phase shift photomask and methods of producing them'1996 5,561,009'Blanks for phase shift photomasks, and phase shift photomasks'1996 5,538,816'Halftone phase shift photomask, halftone phase shift photomask blank, and methods of producing the same'1996 5,419,988'Photomask blank and phase shift photomask'1995 5,380,608'Phase shift photomask comprising a layer of aluminum oxide with magnesium oxide'1995 5,161,233'Method for recording and reproducing information, apparatus therefor and recording medium'1992 4,487,890'Process for producing impact resistant resins'1984 4,173,600'Multi-stage sequentially produced polymer composition'1979

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1979–1984Patents assigned to MITSUBISHI RAYON CO (2)· patent assignee history

1979Based in Yokohama, JP· patent location history

1984Based in Ohtake, JP· patent location history

1992–2020Patents assigned to DAINIPPON PRINTING CO LTD (24)· patent assignee history

1992–2020Based in Tokyo, JP· patent location history

1996–1998Patents assigned to MITSUBISHI ELECTRIC CORP (2)· patent assignee history

1998Based in Chiba, JP· patent location history

2012–2015Patents assigned to MOHRI HIROSHI (2)· patent assignee history

2012Patents assigned to AMANO TSUYOSHI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
DAINIPPON PRINTING CO LTD	24	1992–2020
MITSUBISHI ELECTRIC CORP	2	1996–1998
MITSUBISHI RAYON CO	2	1979–1984
MOHRI HIROSHIself	2	2012–2015
AMANO TSUYOSHI	1	2012

Locations

Location	Patents	Span
Tokyo, JP	24	1992–2020
Chiba, JP	1	1998
Ohtake, JP	1	1984
Yokohama, JP	1	1979