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Inventor

Akira Echizenya

Inventor
Fussa, JP

Overview

3→
Patents
2008–2010
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties33%
G21KHandling of particles or ionising radiation not otherwise provided for33%
LOC2433%
PatentTitleYear
7,860,217'X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same'20107,542,548'X-ray optical system'2009D0566278'X-ray analysis device'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2010Patents assigned to RIGAKU DENKI CO LTD (3)· patent assignee history
2008Based in Tokyo, JP· patent location history
2009–2010Based in Fussa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RIGAKU DENKI CO LTD32008–2010
Locations
LocationPatentsSpan
Fussa, JP22009–2010
Tokyo, JP12008