Inventor
Yosuke Kawabuchi
Inventor
Koshi, JP
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1035%
H01LSemiconductor devices30%
B08BCleaning in general14%
F26BDrying solid materials or objects by removing liquid therefrom5%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B29CShaping or joining of plastics3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering3%
B41JTypewriters3%
C11DDetergent compositions3%
PatentTitleYear
10,950,465Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus202110,867,814Liquid processing method, substrate processing apparatus, and storage medium202010,727,042Liquid processing method, substrate processing apparatus and recording medium202010,692,739Substrate processing apparatus202010,504,718Substrate processing apparatus, substrate processing method, and storage medium201910,395,950Substrate processing apparatus, substrate processing method, and recording medium201910,192,758Substrate processing apparatus20199,805,957'Substrate processing apparatus, substrate processing method and computer-readable storage medium recording therein substrate processing program'20179,362,106'Substrate processing method, substrate processing apparatus, and storage medium'20169,321,085'Substrate processing method, storage medium storing computer program for implementing substrate processing method and substrate processing apparatus'20168,906,165'Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus'20148,545,640'Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus'20138,475,668'Substrate liquid processing apparatus, substrate liquid processing method, and storage medium having substrate liquid processing program stored therein'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2021Patents assigned to TOKYO ELECTRON LTD (13)· patent assignee history
2013–2014Patents assigned to KAWABUCHI YOSUKE (3)· patent assignee history
2013–2014Patents assigned to MINAMI TERUOMI (3)· patent assignee history
2013–2014Patents assigned to OKAMURA NAOYUKI (2)· patent assignee history
2013Patents assigned to FUJII YASUSHI (1)· patent assignee history
2013–2020Based in Koshi, JP· patent location history
2019–2021Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 13 | 2013–2021 |
| KAWABUCHI YOSUKEself | 3 | 2013–2014 |
| MINAMI TERUOMI | 3 | 2013–2014 |
| OKAMURA NAOYUKI | 2 | 2013–2014 |
| FUJII YASUSHI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 8 | 2013–2020 |
| Kumamoto, JP | 5 | 2019–2021 |