Inventor
Shin Hirotsu
Inventor
Miyagi, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H01JElectric discharge tubes or discharge lamps31%
H01LSemiconductor devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H10BElectronic memory devices6%
PatentTitleYear
10,672,589Plasma processing apparatus and control method20209,418,863'Method for etching etching target layer'20169,312,105'Method for etching insulation film'20168,097,534'Method for manufacturing semiconductor device and storage medium'20127,943,523'Plasma etching method and computer readable storage medium'20117,465,670'Plasma etching method, plasma etching apparatus, control program and computer storage medium with enhanced selectivity'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2008–2012Based in Nirasaki, JP· patent location history
2012Patents assigned to HIROTSU SHIN (1)· patent assignee history
2012Patents assigned to OGAWA SHUHEI (1)· patent assignee history
2016–2020Based in Miyagi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2008–2020 |
| HIROTSU SHINself | 1 | 2012 |
| OGAWA SHUHEI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Miyagi, JP | 3 | 2016–2020 |
| Nirasaki, JP | 3 | 2008–2012 |