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Inventor

Rolf Adam

Inventor
Hanau, DE

Overview

6→
Patents
1984–2001
Patent span
Chemistry
Primary field (CPC C)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material40%
H01JElectric discharge tubes or discharge lamps40%
C04BLime, magnesia10%
H05KPrinted circuits10%
PatentTitleYear
6,183,612'Sputtering cathode'20016,139,706'Sputter cathode'20006,077,407'Sputtering cathode based on the magnetron principle'20005,108,571'Process for coating a dielectric substrate with copper'19924,885,070'Method and apparatus for the application of materials'19894,428,809'Method and apparatus for forming electrically conductive transparent oxide'1984

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1984Patents assigned to LEYBOLD HERAEUS GMBH & CO KG (1)· patent assignee history
1984–2001Based in Hanau, DE· patent location history
1989–1992Patents assigned to LEYBOLD AG (2)· patent assignee history
2000–2001Patents assigned to LEYBOLD SYSTEMS GMBH (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LEYBOLD SYSTEMS GMBH32000–2001
LEYBOLD AG21989–1992
LEYBOLD HERAEUS GMBH & CO KG11984
Locations
LocationPatentsSpan
Hanau, DE61984–2001