LexDanaLexDanabeta
Inventor

HIROTO KUDO

Inventor
JP

Overview

1→
Patents
2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds33%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
PatentTitleYear
11,852,970Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to A SCHOOL CORPORATION KANSAI UNIV (1)· patent assignee history
2023Patents assigned to MITSUBISHI GAS CHEMICAL CO (1)· patent assignee history
2023Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
A SCHOOL CORPORATION KANSAI UNIV12023
MITSUBISHI GAS CHEMICAL CO12023
Locations
LocationPatentsSpan
JP12023