Inventor
Isamu Shimoda
Inventor
Zama, JP
Overview
Patents· 44 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
B82YSpecific uses or applications of nanostructures8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
G06KGraphical data reading5%
G09BEducational or demonstration appliances5%
G11CStatic stores5%
H03KPulse technique5%
H04NPictorial communication, e.g. television5%
G06FElectric digital data processing3%
PatentTitleYear
6,515,640'Electron emission device with gap between electron emission electrode and substrate'20035,838,019'Electron emitting element'19985,786,658'Electron emission device with gap between electron emission electrode and substrate'19985,680,158'Communication apparatus including a plurality of light sources arranged in columns and lines corresponding to columns and lines of a plurality of key switches'19975,633,727'Character image processing apparatus'19975,627,670'Scanning optical apparatus having beam scan controller'19975,627,111'Electron emitting device and process for producing the same'19975,610,965'Exposure method'19975,588,839'Information processing apparatus'19965,576,699'Method and apparatus for transferring information by utilizing electron beam'19965,574,438'Method for transferring information, and in particular for performing a logic operation, using electron beams'19965,559,342'Electron emitting device having a polycrystalline silicon resistor coated with a silicide and an oxide of a work function reducing material'19965,498,501'Exposure method'19965,459,573'Light quantity controlling apparatus'19955,390,227'Exposure apparatus'19955,361,015'Electron emission element'19945,355,127'Method and apparatus for transferring information by utilizing electron beam'19945,327,050'Electron emitting device and process for producing the same'19945,306,152'Reading apparatus for eyesight handicapped person'19945,304,815'Electron emission elements'19945,283,681'Scanning optical equipment'19945,267,292'X-ray exposure apparatus'19935,201,681'Method of emitting electrons'19935,185,559'Supply circuit for P-N junction cathode'19935,176,557'Electron emission element and method of manufacturing the same'19935,157,700'Exposure apparatus for controlling intensity of exposure radiation'19925,131,022'Exposure method and apparatus'19925,063,582'Liquid cooled X-ray lithographic exposure apparatus'19915,026,239'Mask cassette and mask cassette loading device'19915,008,703'Exposure apparatus and control of the same'19915,001,734'SOR exposure system'19914,994,708'Cold cathode device'19914,990,771'Scanning optical apparatus having focus position detector'19914,974,736'Multi-electron-beam pattern drawing apparatus'19904,969,168'Wafer supporting apparatus'19904,904,895'Electron emission device'19904,897,552'Multi-electron-beam pattern drawing apparatus'19904,894,611'System for measuring characteristics of electron emitting sources'19904,833,507'Electron emission device'19894,825,082'Electron emitting apparatus'19894,824,218'Optical modulation apparatus using ferroelectric liquid crystal and low-resistance portions of column electrodes'19894,820,930'Photomask positioning device'19894,810,934'Electron emission device'19894,569,562'Method of and apparatus for controlling a fluid bearing'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–2003Patents assigned to CANON KK (44)· patent assignee history
1986–2003Based in Zama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 44 | 1986–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Zama, JP | 44 | 1986–2003 |