Inventor
Paul Stephen McLeod
Inventor
Berkeley, CA, US
Overview
Patents· 40 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material31%
G11BInformation storage based on relative movement between record carrier and transducer19%
H01JElectric discharge tubes or discharge lamps17%
B05DProcesses for applying fluent materials to surfaces, in general8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
C30BSingle-crystal growth2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y02TClimate change mitigation technologies related to transportation2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
PatentTitleYear
9,034,157'Forming oriented film for magnetic recording material'20158,946,651'Multiple anode ion source'20158,808,793'Disc vapor lubrication'20148,728,242'Single disc vapor lubrication'20148,652,310'Trim magnets to adjust erosion rate of cylindrical sputter targets'20148,591,710'Method and apparatus for formation of oriented magnetic films for magnetic recording media'20138,573,579'Biasing a pre-metalized non-conductive substrate'20138,382,902'Single disc vapor lubrication'20138,208,238'Apparatus for orienting soft-underlayer deposition'20128,008,632'Two-zone ion beam carbon deposition'20117,828,899'In-line, pass-by system and method for disc vapor lubrication'20107,537,676'Cathode apparatus to selectively bias pallet during sputtering'20097,141,145'Gas injection for uniform composition reactively sputter-deposited thin films'20067,041,202'Timing apparatus and method to selectively bias during sputtering'20066,886,244'Segmented pallet for disk-shaped substrate electrical biassing and apparatus comprising same'20056,843,892'Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet'20056,844,031'Method & apparatus for multilayer deposition utilizing a common ion beam source'20056,830,600'Cold traps for vapor lubrication processes'20046,808,741'In-line, pass-by method for vapor lubrication'20046,733,590'Method and apparatus for multilayer deposition utilizing a common beam source'20046,613,151'Single disc vapor lubrication'20036,605,195'Multi-layer deposition process using four ring sputter sources'20036,582,572'Target fabrication method for cylindrical cathodes'20036,569,294'Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone'20036,511,702'Apparatus and method to control the molecular weight distribution of a vapor'20036,497,799'Method and apparatus for sputter deposition of multilayer films'20026,482,301'Target shields for improved magnetic properties of a recording medium'20026,468,405'Sputtering target assembly and method for depositing a thickness gradient layer with narrow transition zone'20026,444,100'Hollow cathode sputter source'20026,309,516'Method and apparatus for metal allot sputtering'20016,290,821'Sputter deposition utilizing pulsed cathode and substrate bias power'20016,156,154'Apparatus for etching discs and pallets prior to sputter deposition'20004,838,201'Apparatus and process for vacuum chemical epitaxy'19894,829,021'Process for vacuum chemical epitaxy'19894,776,893'GaAs on GaSb mechanically stacked photovoltaic cells, package assembly, and modules'19884,746,371'Mechanically stacked photovoltaic cells, package assembly, and modules'19884,658,086'Photovoltaic cell package assembly for mechanically stacked photovoltaic cells'19874,131,753'Multiple electron-beam vapor source assembly'19784,125,446'Controlled reflectance of sputtered aluminum layers'19783,956,093'Planar magnetron sputtering method and apparatus'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1978Patents assigned to AIRCO INC (3)· patent assignee history
1976–2015Based in Berkeley, CA, US· patent location history
1987–1988Patents assigned to CHEVRON RES (3)· patent assignee history
2001–2015Patents assigned to SEAGATE TECHNOLOGY LLC (29)· patent assignee history
2012–2015Patents assigned to MCLEOD PAUL STEPHEN (5)· patent assignee history
2012–2015Patents assigned to BRUCKER CHARLES F (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEAGATE TECHNOLOGY LLC | 29 | 2001–2015 |
| MCLEOD PAUL STEPHENself | 5 | 2012–2015 |
| AIRCO INC | 3 | 1976–1978 |
| BRUCKER CHARLES F | 3 | 2012–2015 |
| CHEVRON RES | 3 | 1987–1988 |
Locations
| Location | Patents | Span |
|---|---|---|
| Berkeley, California, US | 40 | 1976–2015 |