LexDanaLexDanabeta
Inventor

MITSUTAKA NAKAMURA

Inventor
JP

Overview

3→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography29%
B41JTypewriters14%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables14%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08LCompositions of macromolecular compounds14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
PatentTitleYear
12,449,757Image forming apparatus having opening- and-closing cover with rotation shaft rotatable with lock levers202511,339,014Attachment, feed device, and image forming apparatus202211,163,234Photosensitive resin composition and method for producing cured relief pattern2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to ASAHI CHEMICAL IND (1)· patent assignee history
2021–2025Based in JP· patent location history
2022–2025Patents assigned to NAKAMURA MITSUTAKA (2)· patent assignee history
2022–2025Patents assigned to RICOH CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAKAMURA MITSUTAKAself22022–2025
RICOH CO LTD22022–2025
ASAHI CHEMICAL IND12021
Locations
LocationPatentsSpan
JP32021–2025