LexDanaLexDanabeta
Inventor

Toshihiko Nakata

Inventor
Hiratsuka, JP

Overview

106→
Patents
1987–2016
Patent span
Physics
Primary field (CPC G)

Patents· 106 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties28%
G01QScanning-probe techniques or apparatus12%
B82YSpecific uses or applications of nanostructures10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H01JElectric discharge tubes or discharge lamps5%
G01BMeasuring length, thickness or similar linear dimensions4%
G02BOptical elements, systems or apparatus4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light3%
PatentTitleYear
9,417,262'Scanning probe microscope and sample observation method using same'20169,267,898'Optical inspection method and optical inspection apparatus'20169,182,592'Optical filtering device, defect inspection method and apparatus therefor'20159,134,279'Internal defect inspection method and apparatus for the same'20159,063,168'Scanning probe microscope and measurement method using same'20158,885,037'Defect inspection method and apparatus therefor'20148,860,946'Polarizing different phases of interfered light used in a method and apparatus for measuring displacement of a specimen'20148,844,061'Scanning probe microscope'20148,804,112'Method of defect inspection and device of defect inspection'20148,787,134'Thermally assisted magnetic recording head inspection method and apparatus'20148,736,830'Pattern inspection device of substrate surface and pattern inspection method of the same'20148,713,710'Cantilever of scanning probe microscope and method for manufacturing the same, method for inspecting thermal assist type magnetic head device and its apparatus'20148,695,110'Scanning probe microscope and sample observing method using the same'20148,670,116'Method and device for inspecting for defects'20148,659,761'Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light'20148,656,509'Scanning probe microscope and surface shape measuring method using same'20148,634,069'Defect inspection device and defect inspection method'20148,635,710'Scanning probe microscope and method of observing sample using the same'20148,629,985'Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope'20148,553,214'Method and equipment for detecting pattern defect'20138,508,727'Defects inspecting apparatus and defects inspecting method'20138,483,035'Thermally assisted magnetic recording head inspection method and apparatus'20138,462,330'Method and apparatus for detecting defects'20138,451,439'Apparatus and method for inspecting pattern'20138,407,811'Scanning probe microscope and method of observing sample using the same'20138,361,784'Method of inspecting a DNA chip and apparatus thereof'20138,353,060'Scanning probe microscope and a measuring method using the same'20138,342,008'Scanning probe microscope'20138,284,406'Displacement measurement method and apparatus thereof, stage apparatus, and probe microscope'20128,272,068'Scanning probe microscope and sample observing method using the same'20128,228,495'Defects inspecting apparatus and defects inspecting method'20128,181,268'Scanning probe microscope and method of observing sample using the same'20128,149,395'Apparatus and method for inspecting pattern'20128,107,065'Method and apparatus for detecting defects'20128,064,066'Method and apparatus for measuring displacement of a sample to be inspected using an interference light'20118,011,230'Scanning probe microscope'20118,013,989'Defects inspecting apparatus and defects inspecting method'20117,966,867'Scanning probe microscope'20117,911,601'Apparatus and method for inspecting pattern'20117,834,353'Method of manufacturing display device'20107,791,725'Method and equipment for detecting pattern defect'20107,768,634'Defects inspecting apparatus and defects inspecting method'20107,751,037'Method and apparatus for detecting defects'20107,716,970'Scanning probe microscope and sample observation method using the same'20107,631,548'Scanning probe microscope'20097,612,889'Method and apparatus for measuring displacement of a sample'20097,562,564'Scanning probe microscope and sample observing method using this and semiconductor device production method'20097,528,942'Method and apparatus for detecting defects'20097,511,828'Three-dimensional shape measuring unit, processing unit, and semiconductor device manufacturing method'20097,456,963'Method and equipment for detecting pattern defect'20087,446,866'Apparatus and method for inspecting pattern'20087,417,721'Defect detector and defect detecting method'20087,355,143'Circuit board production method and its apparatus'20087,326,623'Method of manufacturing display device'20087,323,684'Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope'20087,305,015'Ultraviolet laser-generating device and defect inspection apparatus and method therefor'20077,271,908'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'20077,251,024'Defect inspection method and apparatus therefor'20077,217,573'Method of inspecting a DNA chip'20077,218,389'Method and apparatus for inspecting pattern defects'20077,175,875'Method and apparatus for plasma processing'20077,132,669'Method and equipment for detecting pattern defect'20067,129,124'Display device, process of fabricating same, and apparatus for fabricating same'20067,081,953'Apparatus and method for inspecting pattern'20067,067,806'Scanning probe microscope and specimen observation method'20066,943,876'Method and apparatus for detecting pattern defects'20056,943,086'Laser annealing apparatus, TFT device and annealing method of the same'20056,921,905'Method and equipment for detecting pattern defect'20056,897,956'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'20056,877,365'Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope'20056,831,737'Apparatus and method for inspecting pattern'20046,831,277'Method for measuring dimensions and alignment of thin film magnetic head and apparatus therefor'20046,825,437'Apparatus enabling particle detection utilizing wide view lens'20046,819,416'Defect inspection method and apparatus therefor'20046,800,859'Method and equipment for detecting pattern defect'20046,778,272'Method of processing a semiconductor device'20046,765,201'Ultraviolet laser-generating device and defect inspection apparatus and method therefor'20046,721,047'Method and apparatus for inspecting defects of a specimen'20046,712,928'Method and its apparatus for detecting floating particles in a plasma processing chamber and an apparatus for processing a semiconductor device'20046,667,806'Process and apparatus for manufacturing semiconductor device'20036,631,547'Manufacturing method for thin film magnetic heads'20036,621,571'Method and apparatus for inspecting defects in a patterned specimen'20036,613,588'Floating particle inspection method and its apparatus and a semiconductor device processing apparatus'20036,576,559'Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses'20036,556,290'Defect inspection method and apparatus therefor'20036,355,570'Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses'20025,989,928'Method and device for detecting end point of plasma treatment, method and device for manufacturing semiconductor device, and semiconductor device'19995,781,294'Method and apparatus for detecting photoacoustic signal to detect surface and subsurface information of the specimen'19985,656,811'Method for making specimen and apparatus thereof'19975,645,351'Temperature measuring method using thermal expansion and an apparatus for carrying out the same'19975,479,259'Method and apparatus for detecting photoacoustic signal'19955,377,006'Method and apparatus for detecting photoacoustic signal'19945,333,495'Method and apparatus for processing a minute portion of a specimen'19945,214,282'Method and apparatus for processing a minute portion of a specimen'19935,136,172'Method and apparatus for detecting photoacoustic signal'19925,083,869'Photocoustic signal detecting device'19925,062,715'Method and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor device'19915,046,847'Method for detecting foreign matter and device for realizing same'19914,906,852'Projection alignment method and apparatus'19904,795,261'Reduction projection type aligner'19894,788,577'Substrate surface deflecting device'19884,777,374'Pattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target pattern'19884,744,666'Alignment detection optical system of projection type aligner'19884,725,737'Alignment method and apparatus for reduction projection type aligner'19884,701,050'Semiconductor exposure apparatus and alignment method therefor'19874,668,089'Exposure apparatus and method of aligning exposure mask with workpiece'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2016Patents assigned to HITACHI LTD (86)· patent assignee history
1987–2014Based in Yokohama, JP· patent location history
1992–2016Based in Hiratsuka, JP· patent location history
2002Based in Hiratuska, JP· patent location history
2006–2016Based in Tokyo, JP· patent location history
2007–2014Patents assigned to HITACHI HIGH TECH CORP (17)· patent assignee history
2011–2016Patents assigned to NAKATA TOSHIHIKO (32)· patent assignee history
2011–2015Patents assigned to WATANABE MASAHIRO (20)· patent assignee history
2011–2014Patents assigned to BABA SHUICHI (7)· patent assignee history
2014Based in Hiraduka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD861987–2016
NAKATA TOSHIHIKOself322011–2016
WATANABE MASAHIRO202011–2015
HITACHI HIGH TECH CORP172007–2014
BABA SHUICHI72011–2014
Locations
LocationPatentsSpan
Hiratsuka, JP761992–2016
Yokohama, JP211987–2014
Tokyo, JP62006–2016
Hiraduka, JP12014
Hiratuska, JP12002